摘要
A novel electrostatic discharge (ESD) protection device with a threshold voltage of ∼0V for complementary metal-oxide semiconductor (CMOS) integrated circuits in sub-quarter-micron CMOS technology is proposed. Quite different to the traditional ESD protection devices, such an active ESD device is originally standing in its turn-on state when the IC is zapped under ESD events. Therefore, such an active ESD device has the fastest turn-on speed and the lowest turn-on voltage to effectively protect the internal circuits with a much thinner gate oxide in future sub-0.1 μm CMOS technology. The proposed active BSD device is fully process-compatible to the general sub-quarter-micron CMOS process.
原文 | English |
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期刊 | Japanese Journal of Applied Physics, Part 2: Letters |
卷 | 43 |
發行號 | 1 A/B |
DOIs | |
出版狀態 | Published - 15 1月 2004 |