Ab initio chemical kinetics for the CH3 + O(3P) reaction and related isomerization-decomposition of CH3O and CH2OH radicals

Z. F. Xu*, P. Raghunath, Ming-Chang Lin*

*此作品的通信作者

研究成果: Article同行評審

26 引文 斯高帕斯(Scopus)

摘要

The kinetics and mechanism of the CH3 + O reaction and related isomerization-decomposition of CH3O and CH2OH radicals have been studied by ab initio molecular orbital theory based on the CCSD(T)/aug-cc-pVTZ//CCSD/aug-cc-pVTZ, CCSD/aug-cc-pVDZ, and G2M//B3LYP/6-311+G(3df,2p) levels of theory. The predicted potential energy surface of the CH3 + O reaction shows that the CHO + H2 products can be directly generated from CH3O by the TS3 → LM1 → TS7 → LM2 → TS4 path, in which both LM1 and LM2 are very loose and TS7 is roaming-like. The result for the CH2O + H reaction shows that there are three low-energy barrier processes including CH2O + H → CHO + H2 via H-abstraction and CH2O + H → CH2OH and CH2O + H → CH3O by addition reactions. The predicted enthalpies of formation of the CH2OH and CH3O radicals at 0 K are in good agreement with available experimental data. Furthermore, the rate constants for the forward and some key reverse reactions have been predicted at 200-3000 K under various pressures. Based on the new reaction pathway for CH3 + O, the rate constants for the CH2O + H and CHO + H2 reactions were predicted with the microcanonical variational transition-state/Rice-Ramsperger-Kassel-Marcus (VTST/RRKM) theory. The predicted total and individual product branching ratios (i.e., CO versus CH2O) are in good agreement with experimental data. The rate constant for the hydrogen abstraction reaction of CH2O + H has been calculated by the canonical variational transition-state theory with quantum tunneling and small-curvature corrections to be k(CH2O + H → CHO + H2) = 2.28 × 10-19 T2.65 exp(-766.5/T) cm3 molecule-1 s-1 for the 200-3000 K temperature range. The rate constants for the addition giving CH3O and CH2OH and the decomposition of the two radicals have been calculated by the microcanonical RRKM theory with the time-dependent master equation solution of the multiple quantum well system in the 200-3000 K temperature range at 1 Torr to 100 atm. The predicted rate constants are in good agreement with most of the available data.

原文English
頁(從 - 到)7404-7417
頁數14
期刊Journal of Physical Chemistry A
119
發行號28
DOIs
出版狀態Published - 9 3月 2015

指紋

深入研究「Ab initio chemical kinetics for the CH3 + O(3P) reaction and related isomerization-decomposition of CH3O and CH2OH radicals」主題。共同形成了獨特的指紋。

引用此