A World First QLC RRAM: Highly Reliable Resistive-Gate Flash with Record 108Endurance and Excellent Retention

M. Y. Li, J. P. Lee, C. H. Liu, J. C. Guo, Steve S. Chung*

*此作品的通信作者

研究成果: Conference contribution同行評審

摘要

In this paper, we demonstrated successfully a quad-level cell (QLC) of a resistive-gate memory. It was implemented in a 1k bits chip with integration of FinFET core on a mature logic platform. Comprehensive reliabilities have been examined. The results show the forming-free property, low programming current (< μ A), high endurance and excellent data retention. A record high 5×108 endurance can be achieved. Furthermore, a 4-bit-per-cell (16 levels) has been demonstrated successfully. The chip-level performance is also analyzed, showing well disturbance-immune during SET/RESET, READ, which kept healthy signal-to-noise margin, 2-3x. This architecture is a strong candidate for the next generation resistance memory.

原文English
主出版物標題2023 IEEE International Reliability Physics Symposium, IRPS 2023 - Proceedings
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781665456722
DOIs
出版狀態Published - 2023
事件61st IEEE International Reliability Physics Symposium, IRPS 2023 - Monterey, United States
持續時間: 26 3月 202330 3月 2023

出版系列

名字IEEE International Reliability Physics Symposium Proceedings
2023-March
ISSN(列印)1541-7026

Conference

Conference61st IEEE International Reliability Physics Symposium, IRPS 2023
國家/地區United States
城市Monterey
期間26/03/2330/03/23

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