A Unified Statistical Analysis of Comprehensive Fluctuations of Gate-All-Around Silicon Nanosheet MOSFETs Induced by RDF, ITF, and WKF Simultaneously

Sekhar Reddy Kola, Yiming Li*, Chieh Yang Chen, Min Hui Chuang

*此作品的通信作者

研究成果: Conference contribution › 同行評審

1 引文 斯高帕斯（Scopus）

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Engineering & Materials Science