A Unified Statistical Analysis of Comprehensive Fluctuations of Gate-All-Around Silicon Nanosheet MOSFETs Induced by RDF, ITF, and WKF Simultaneously

  • Sekhar Reddy Kola
  • , Yiming Li*
  • , Chieh Yang Chen
  • , Min Hui Chuang
    • *此作品的通信作者

研究成果: Conference contribution › 同行評審

8 引文 斯高帕斯（Scopus）

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Keyphrases

Material Science

Engineering

Computer Science

Chemical Engineering