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A study on the radiation hardness of flash cell with horn-shaped floating-gate

  • Tiao Yuan Huang*
  • , Fuh Cheng Jong
  • , Tien-Sheng Chao
  • , Horng-Chih Lin
  • , Len Yi Leu
  • , Konrad Young
  • , Chen Hsi Lin
  • , Kuang Y. Chiu
  • *此作品的通信作者

研究成果: Article › 同行評審

摘要

The effects of radiation on the characteristics of split-gate electrical erasable programmable read only memory (EEPROM)/flash cells with recently-proposed horn-shaped floating gates are studied in terms of cell read current, data retention, cycling endurance, program/erase efficiency, threshold voltage and junction leakage. Our results show that the cells appear to survive after 1 Mrad (Si) Co60 irradiation. Moreover, the after-irradiation cell read current actually increases in the "erase" (i.e., low-threshold voltage, high-conducting) state (i.e., improves), albeit the cell read current also increases in the "program" (i.e., high-threshold voltage, low-conducting) state (i.e., a degradation). Our results also show that, despite an improvement in the initial read current in the "erase" state immediately after radiation, the write/erase cycling endurance of the flash cells is significantly impeded after irradiation, due to a much faster "window closure" rate in the "erase" state, although the cell read current is found to remain relatively stable in the "program" state after cycling.

原文English
頁(從 - 到)5459-5463
頁數5
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
卷36
發行號9 A
DOIs
出版狀態Published - 9月 1997

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