A novel p-n-diode structure of SONOS-type TFT NVM with embedded silicon nanocrystals

Tsung Yu Chiang*, William Cheng Yu Ma, Yi Hong Wu, Kuan Ti Wang, Tien-Sheng Chao

*此作品的通信作者

研究成果: Article同行評審

7 引文 斯高帕斯(Scopus)

摘要

In this letter, for the first time, a novel p-n-diode (PND) structure of SONOS-type thin-film transistor (TFT) nonvolatile memory (NVM) with embedded silicon nanocrystals (Si-NCs) in the silicon nitride layer using an in situ method is successfully demonstrated. This novel structure has many advantages, including high density and suitability for 3-D circuit integration. Hot-electron injection and hot-hole injection are used as the program and erase methods, respectively. The sensing current of the three-terminal PND-TFT NVM is 10 -7 A by the band-to-band tunneling current. A much larger memory window >12V) and good data retention time (108s for 12% charge loss) are exhibited. The device appears to have great potential for system-on-panel applications.

原文English
文章編號5565385
頁(從 - 到)1239-1241
頁數3
期刊IEEE Electron Device Letters
31
發行號11
DOIs
出版狀態Published - 1 11月 2010

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