A Novel Method of Electrical Measurement for Stacking Error in 3D/2.5D Integration

Shih Wei Lee, Shu Chiao Kuo, Kuan-Neng Chen

研究成果: Article同行評審

摘要

A novel method for the inspection of the stacking misalignment in three-dimensional integration circuit (3DIC) by using electrical measurement is proposed. The metal line pattern designed in this paper combined with bump-less TSV fabrication process can successfully detect the direction and quantity of stacking fault. In addition, circuit combined with testing structure can be developed and simulated by using the current mirror concept and offered measurements with better efficiency.
原文American English
頁(從 - 到)1066-1069
頁數4
期刊Journal of Nanoscience and Nanotechnology
18
發行號2
DOIs
出版狀態Published - 2月 2018

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