摘要
A novel thin film transistor (TFT) capable of ambipolar operation is demonstrated. The field induced source drain region supplies abundant channel carriers during on-state. On the other hand, the region reduces off-state leakage. The suggested device structure and fabrication is advantageous in making the overall process simple and suitable for low temperature manufacturing. The ambipolar mode with superior characteristic is demonstrated.
原文 | English |
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頁(從 - 到) | 857-859 |
頁數 | 3 |
期刊 | Technical Digest - International Electron Devices Meeting |
DOIs | |
出版狀態 | Published - 2000 |