A novel four-mask-step low-temperature polysilicon thin-film transistor with self-aligned raised source/drain (SARSD)

Kow-Ming Chang*, Gin Min Lin, Cheng Guo Chen, Mon Fan Hsieh

*此作品的通信作者

研究成果: Article同行評審

8 引文 斯高帕斯(Scopus)

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Engineering & Materials Science

Chemical Compounds