A new failure mechanism on analog I/O cell under ND-mode ESD stress in deep-submicron CMOS technology

Shih Hung Chen*, Ming-Dou Ker, Che Hao Chuang

*此作品的通信作者

    研究成果: Paper同行評審

    1 引文 斯高帕斯(Scopus)

    指紋

    深入研究「A new failure mechanism on analog I/O cell under ND-mode ESD stress in deep-submicron CMOS technology」主題。共同形成了獨特的指紋。

    Engineering & Materials Science