A computational study on the device performance of graphene nanoribbon heterojunction tunneling FETs based on bandgap engineering

  • Kai Tak Lam*
  • , Haixia Da
  • , Sai Kong Chin
  • , G. Samudra
  • , Yee Chia Yeo
  • , Gengchiau Liang
  • *此作品的通信作者

研究成果: Conference contribution同行評審

摘要

Novel device structures and electronic materials are required to further enhance the performance of digital circuits after the current MOSFET technology reaches its physical limits. While tunneling mechanism degrades the short channel MOSFET performance, it can be utilized as the major device operation in tunneling field-effect transistors (TFET) with promising features such as lower sub-threshold swing and OFF-state current (IOFF). Furthermore, semiconducting graphene nanoribbon (GNR) has been proposed as a potential electronic material for TFET application due to its unique properties such as ultra-thin body structure and high carrier mobility. A small bandgap (E G) material near the source-channel interface can be introduced to form heterojunction (HJ) which leads to a larger ION [1-3]. Therefore, in this work, we investigate the impact of the length and E G of this HJ region on the device performance of graphene nanoribbon TFET.

原文English
主出版物標題68th Device Research Conference, DRC 2010
頁面79-80
頁數2
DOIs
出版狀態Published - 2010
事件68th Device Research Conference, DRC 2010 - Notre Dame, IN, 美國
持續時間: 21 6月 201023 6月 2010

出版系列

名字Device Research Conference - Conference Digest, DRC
ISSN(列印)1548-3770

Conference

Conference68th Device Research Conference, DRC 2010
國家/地區美國
城市Notre Dame, IN
期間21/06/1023/06/10

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