A comprehensive study of Ge1-xSix on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage

Guang Li Luo; Shih Chiang Huang; Cheng Ting Chung; Dawei Heh; Chao-Hsin Chien; Chao Ching Cheng; Yao Jen Lee; Wen Fa Wu; Chiung Chih Hsu; Mei Ling Kuo; Jay Yi Yao; Mao Nan Chang; Chee Wee Liu; Chen-Ming Hu; Chun Yen Chang; Fu Liang Yang

doi:10.1109/IEDM.2009.5424246

A comprehensive study of Ge_1-xSi_x on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage

Guang Li Luo^*
, Shih Chiang Huang
, Cheng Ting Chung
, Dawei Heh
, Chao-Hsin Chien
, Chao Ching Cheng
, Yao Jen Lee
, Wen Fa Wu
, Chiung Chih Hsu
, Mei Ling Kuo
, Jay Yi Yao
, Mao Nan Chang
, Chee Wee Liu
, Chen-Ming Hu
, Chun Yen Chang
, Fu Liang Yang

^*此作品的通信作者

國際半導體產業學院

研究成果: Conference contribution › 同行評審

3 引文斯高帕斯（Scopus）

摘要

For the first time, growth of high-quality Ge-rich Ge_1-xSi _x (0≤x≤0.14) layers on Ge substrate was demonstrated. An effective suppression of the phosphorus diffusion in Ge_1-xSi _x and a better thermal stability of the nickel germanide on Ge _1-xSi_x were observed. A higher rectifying ratio with a reduced diode leakage current in n⁺-Ge_1-xSi _x/p-Ge1-xSix is compared with n⁺-Ge/p-Ge. These results indicate that it is suitable for Ge_1-xSi_x to be used as source/drain (S/D) to fabricate the uniaxial tensile-strained channel Ge nMOSFETs.

原文	English
主出版物標題	2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest
頁面	29.5.1-29.5.4
DOIs	https://doi.org/10.1109/IEDM.2009.5424246
出版狀態	Published - 2009
事件	2009 International Electron Devices Meeting, IEDM 2009 - Baltimore, MD, 美國持續時間: 7 12月 2009 → 9 12月 2009

出版系列

名字	Technical Digest - International Electron Devices Meeting, IEDM
ISSN（列印）	0163-1918

Conference

Conference	2009 International Electron Devices Meeting, IEDM 2009
國家/地區	美國
城市	Baltimore, MD
期間	7/12/09 → 9/12/09

存取文件

10.1109/IEDM.2009.5424246

其它文件與鏈接

Link to publication in Scopus

引用此

Luo, G. L., Huang, S. C., Chung, C. T., Heh, D., Chien, C.-H., Cheng, C. C., Lee, Y. J., Wu, W. F., Hsu, C. C., Kuo, M. L., Yao, J. Y., Chang, M. N., Liu, C. W., Hu, C.-M., Chang, C. Y., & Yang, F. L. (2009). A comprehensive study of Ge_1-xSi_x on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage. 於 2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest (頁 29.5.1-29.5.4). 文章 5424246 (Technical Digest - International Electron Devices Meeting, IEDM). https://doi.org/10.1109/IEDM.2009.5424246

@inproceedings{6e55055e26a54052b56edac8a6233471,

title = "A comprehensive study of Ge1-xSix on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage",

abstract = "For the first time, growth of high-quality Ge-rich Ge1-xSi x (0≤x≤0.14) layers on Ge substrate was demonstrated. An effective suppression of the phosphorus diffusion in Ge1-xSi x and a better thermal stability of the nickel germanide on Ge 1-xSix were observed. A higher rectifying ratio with a reduced diode leakage current in n+-Ge1-xSi x/p-Ge1-xSix is compared with n+-Ge/p-Ge. These results indicate that it is suitable for Ge1-xSix to be used as source/drain (S/D) to fabricate the uniaxial tensile-strained channel Ge nMOSFETs.",

author = "Luo, \{Guang Li\} and Huang, \{Shih Chiang\} and Chung, \{Cheng Ting\} and Dawei Heh and Chao-Hsin Chien and Cheng, \{Chao Ching\} and Lee, \{Yao Jen\} and Wu, \{Wen Fa\} and Hsu, \{Chiung Chih\} and Kuo, \{Mei Ling\} and Yao, \{Jay Yi\} and Chang, \{Mao Nan\} and Liu, \{Chee Wee\} and Chen-Ming Hu and Chang, \{Chun Yen\} and Yang, \{Fu Liang\}",

year = "2009",

doi = "10.1109/IEDM.2009.5424246",

language = "English",

isbn = "9781424456406",

series = "Technical Digest - International Electron Devices Meeting, IEDM",

pages = "29.5.1--29.5.4",

booktitle = "2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest",

note = "2009 International Electron Devices Meeting, IEDM 2009 ; Conference date: 07-12-2009 Through 09-12-2009",

}

Luo, GL, Huang, SC, Chung, CT, Heh, D, Chien, C-H, Cheng, CC, Lee, YJ, Wu, WF, Hsu, CC, Kuo, ML, Yao, JY, Chang, MN, Liu, CW, Hu, C-M, Chang, CY & Yang, FL 2009, A comprehensive study of Ge_1-xSi_x on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage. 於 2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest., 5424246, Technical Digest - International Electron Devices Meeting, IEDM, 頁 29.5.1-29.5.4, 2009 International Electron Devices Meeting, IEDM 2009, Baltimore, MD, 美國, 7/12/09. https://doi.org/10.1109/IEDM.2009.5424246

A comprehensive study of Ge_1-xSi_x on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage. / Luo, Guang Li; Huang, Shih Chiang; Chung, Cheng Ting 等.
2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest. 2009. p. 29.5.1-29.5.4 5424246 (Technical Digest - International Electron Devices Meeting, IEDM).

研究成果: Conference contribution › 同行評審

TY - GEN

T1 - A comprehensive study of Ge1-xSix on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage

AU - Luo, Guang Li

AU - Huang, Shih Chiang

AU - Chung, Cheng Ting

AU - Heh, Dawei

AU - Chien, Chao-Hsin

AU - Cheng, Chao Ching

AU - Lee, Yao Jen

AU - Wu, Wen Fa

AU - Hsu, Chiung Chih

AU - Kuo, Mei Ling

AU - Yao, Jay Yi

AU - Chang, Mao Nan

AU - Liu, Chee Wee

AU - Hu, Chen-Ming

AU - Chang, Chun Yen

AU - Yang, Fu Liang

PY - 2009

Y1 - 2009

N2 - For the first time, growth of high-quality Ge-rich Ge1-xSi x (0≤x≤0.14) layers on Ge substrate was demonstrated. An effective suppression of the phosphorus diffusion in Ge1-xSi x and a better thermal stability of the nickel germanide on Ge 1-xSix were observed. A higher rectifying ratio with a reduced diode leakage current in n+-Ge1-xSi x/p-Ge1-xSix is compared with n+-Ge/p-Ge. These results indicate that it is suitable for Ge1-xSix to be used as source/drain (S/D) to fabricate the uniaxial tensile-strained channel Ge nMOSFETs.

AB - For the first time, growth of high-quality Ge-rich Ge1-xSi x (0≤x≤0.14) layers on Ge substrate was demonstrated. An effective suppression of the phosphorus diffusion in Ge1-xSi x and a better thermal stability of the nickel germanide on Ge 1-xSix were observed. A higher rectifying ratio with a reduced diode leakage current in n+-Ge1-xSi x/p-Ge1-xSix is compared with n+-Ge/p-Ge. These results indicate that it is suitable for Ge1-xSix to be used as source/drain (S/D) to fabricate the uniaxial tensile-strained channel Ge nMOSFETs.

UR - https://www.scopus.com/pages/publications/77952330177

U2 - 10.1109/IEDM.2009.5424246

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M3 - Conference contribution

AN - SCOPUS:77952330177

SN - 9781424456406

T3 - Technical Digest - International Electron Devices Meeting, IEDM

SP - 29.5.1-29.5.4

BT - 2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest

T2 - 2009 International Electron Devices Meeting, IEDM 2009

Y2 - 7 December 2009 through 9 December 2009

ER -

Luo GL, Huang SC, Chung CT, Heh D, Chien CH, Cheng CC 等. A comprehensive study of Ge_1-xSi_x on Ge for the Ge nMOSFETs with tensile stress, shallow junctions and reduced leakage. 於 2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest. 2009. p. 29.5.1-29.5.4. 5424246. (Technical Digest - International Electron Devices Meeting, IEDM). doi: 10.1109/IEDM.2009.5424246