摘要
Experimental measurements and 2-D device simulation are used to investigate a capacitorless, asymmetric double-gate DRAM (DG-DRAM) design. Soft error problems are discussed. Careful attention to cell geometry and film quality results in intrinsic retention times suitable for stand-alone and embedded memories.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 843-846 |
| 頁數 | 4 |
| 期刊 | Technical Digest - International Electron Devices Meeting |
| DOIs | |
| 出版狀態 | Published - 2002 |
| 事件 | 2002 IEEE International Devices Meeting (IEDM) - San Francisco, CA, 美國 持續時間: 8 12月 2002 → 11 12月 2002 |
指紋
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