3D-TCAD simulation study of the contact all around T-FinFET structure for 10nm metal-oxide-semiconductor field-effect transistor

Chen Han Chou, Chung Chun Hsu, Wen Kuan Yeh, Steve S. Chung, Chao-Hsin Chien*

*此作品的通信作者

研究成果: Conference contribution › 同行評審

3 引文 斯高帕斯（Scopus）

指紋

深入研究「3D-TCAD simulation study of the contact all around T-FinFET structure for 10nm metal-oxide-semiconductor field-effect transistor」主題。共同形成了獨特的指紋。

Chemical Compounds

Engineering & Materials Science