2D Layered Semiconductors beyond MoS2

Wen-Hao Chang*

*此作品的通信作者

研究成果: Conference contribution同行評審

原文American English
主出版物標題2019 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA)
發行者IEEE
頁數1
DOIs
出版狀態Published - 八月 2019
事件International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu
持續時間: 22 四月 201925 四月 2019

出版系列

名字International Symposium on VLSI Technology Systems and Applications-Proceedings of the Technical Papers
發行者IEEE
ISSN(列印)1930-8868

Conference

ConferenceInternational Symposium on VLSI Technology, Systems and Application (VLSI-TSA)
城市Hsinchu
期間22/04/1925/04/19

引用此