0.15 μm CMOS foundry technology with 0.1 μm devices for high performance applications

C. H. Diaz*, M. Chang, W. Chen, M. Chiang, H. Su, S. Chang, P. Lu, Chen-Ming Hu, K. Pan, C. Yang, L. Chen, C. Su, C. Wu, C. H. Wang, C. C. Wang

*此作品的通信作者

研究成果: Conference article › 同行評審

16 引文 斯高帕斯（Scopus）

指紋

深入研究「0.15 μm CMOS foundry technology with 0.1 μm devices for high performance applications」主題。共同形成了獨特的指紋。

Keyphrases

Engineering