表層拓印高分子及其製備方法

@misc{a8ff43c314c64fed8a058882412575cd,

title = "表層拓印高分子及其製備方法",

author = "Su-Min Chang",

year = "2016",

month = may,

day = "21",

language = "???core.languages.zh_TW???",

type = "Patent",

note = "I534205",

}

表層拓印高分子及其製備方法. / Chang, Su-Min (Inventor).

專利號: I534205. 5月 21, 2016.

研究成果: Patent

TY - PAT

T1 - 表層拓印高分子及其製備方法

AU - Chang, Su-Min

PY - 2016/5/21

Y1 - 2016/5/21

M3 - Patent

M1 - I534205

ER -

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