搜尋結果
2006
Tin oxides
100%
Indium
94%
Light emitting diodes
71%
Purity
36%
Annealing
28%
Annealing
100%
annealing
60%
Carrier concentration
53%
Hot Temperature
48%
Photoluminescence
40%
2005
Wafer bonding
100%
Light emitting diodes
69%
Luminance
67%
Lattice mismatch
62%
brightness
60%
Amorphous silicon
100%
Crystallization
79%
tensile stress
74%
Tensile stress
73%
amorphous silicon
67%
Fang, J. Y. ,
Tsai, M. S. ,
Dai, B. T. ,
Wu, Y-C. &
Feng, M. S. ,
1 6月 2005 ,
於: Electrochemical and Solid-State Letters. 8 ,
5 研究成果: Article › 同行評審
Passivation
100%
abrasives
98%
Polishing
95%
polishing
86%
Abrasives
84%
Tin oxides
100%
Indium
94%
short circuits
86%
p-n junctions
74%
Annealing
71%
Wafer bonding
100%
Tin oxides
96%
Indium
91%
Light emitting diodes
69%
indium oxides
69%
2004
Cheng, Y. L. ,
Wang, Y. L. ,
Lan, J. K. ,
Chen, H. C. ,
Lin, J. H. ,
Wu, Y. L. ,
Liu, P-T. ,
Wu, Y-C. &
Feng, M. S. ,
22 12月 2004 ,
於: Thin Solid Films. 469-470 ,
SPEC. ISS. ,
p. 178-183 6 p. 研究成果: Article › 同行評審
Plasma enhanced chemical vapor deposition
100%
Plasma Enhanced Chemical Vapour Deposition
84%
Electric properties
74%
Permittivity
70%
Dielectric Constant
64%
Liu, P. C. ,
Lu, C. L. ,
Wu, Y-C. ,
Cheng, J. H. &
Ouyang, H. ,
1 11月 2004 ,
於: Applied Physics Letters. 85 ,
21 ,
p. 4831-4833 3 p. 研究成果: Article › 同行評審
electrical resistance
100%
wafers
70%
annealing
56%
oxides
39%
temperature
27%
light emitting diodes
100%
wafers
94%
metals
64%
barrier layers
27%
indium oxides
24%
Microcrystalline silicon
100%
Inductively coupled plasma
80%
Microcrystallinity
58%
Inductively Coupled Plasma
53%
synthesis
38%
2003
Chao, C. W. ,
Wu, Y-C. ,
Hu, G. R. &
Feng, M. S. ,
4月 2003 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 42 ,
4R ,
p. 1556-1559 4 p. 研究成果: Article › 同行評審
Electroless plating
100%
Thin film transistors
94%
Polysilicon
85%
plating
81%
Crystallization
80%
short circuits
100%
electric contacts
74%
leakage
69%
light emitting diodes
66%
annealing
50%
Lin, Y. D. ,
Wu, Y-C. ,
Chao, C. W. &
Hu, G. R. ,
26 6月 2003 ,
於: Materials Chemistry and Physics. 80 ,
3 ,
p. 577-580 4 p. 研究成果: Article › 同行評審
Amorphous silicon
100%
Amorphous Silicon
99%
Crystallization
79%
silicon films
78%
amorphous silicon
67%
Amorphous silicon
100%
Amorphous Silicon
99%
Electroless plating
98%
Carbon nanotubes
77%
Thin films
69%
Vapor phase epitaxy
100%
Vapor Phase Epitaxy
89%
Hydrides
71%
vapor phase epitaxy
58%
hydrides
57%
Chao, C. P. ,
Wu, Y-C. ,
Lee, T. L. &
Wang, Y. H. ,
9月 2003 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 42 ,
9 A ,
p. 5527-5530 4 p. 研究成果: Article › 同行評審
Wafer bonding
100%
Amorphous silicon
95%
Crystallization
76%
amorphous silicon
64%
crystallization
53%
2002
Chao, C. W. ,
Hu, G. R. ,
Wu, Y-C. ,
Chen, Y. C. &
Feng, M. S. ,
1 2月 2002 ,
於: Electrochemical and Solid-State Letters. 5 ,
2 ,
p. C31-C32 2 p. 研究成果: Article › 同行評審
Amorphous silicon
100%
Amorphous Silicon
99%
Polysilicon
84%
Crystallization
79%
Thin films
69%
Hu, G. R. ,
Wu, Y-C. ,
Chao, C. W. &
Huang, T. J. ,
11月 2002 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 41 ,
11R ,
p. 6356-6357 2 p. 研究成果: Article › 同行評審
Amorphous silicon
100%
Electroless plating
98%
plating
80%
Crystallization
79%
Thin films
69%
healing
100%
voids
75%
wafers
64%
crystallites
56%
kinetics
51%
Wu, Y-C. ,
Liu, P. C. ,
Feigelson, R. S. &
Route, R. K. ,
15 2月 2002 ,
於: Journal of Applied Physics. 91 ,
3 ,
p. 1973-1977 5 p. 研究成果: Article › 同行評審
healing
100%
voids
75%
wafers
64%
crystallites
21%
diamonds
19%
2001
Chen, Y. C. ,
Wu, Y-C. ,
Chao, C. W. ,
Hu, G. R. &
Feng, M. S. ,
9月 2001 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 40 ,
9R ,
p. 5244-5246 3 p. 研究成果: Article › 同行評審
Amorphous silicon
100%
Electroless plating
98%
Plating
81%
plating
80%
Crystallization
79%
2000
Chen, Y. C. ,
Wu, Y-C. ,
Tung, I. C. ,
Chao, C. W. ,
Feng, M. S. &
Chen, H. C. ,
16 10月 2000 ,
於: Applied Physics Letters. 77 ,
16 ,
p. 2521-2523 3 p. 研究成果: Article › 同行評審
silicon films
100%
excimer lasers
93%
ultrahigh vacuum
93%
vapor deposition
71%
flux density
62%
1998
Zheng, D. ,
Gordon, L. A. ,
Wu, Y-C. ,
Feigelson, R. S. ,
Fejer, M. M. ,
Byer, R. L. &
Vodopyanov, K. L. ,
1 7月 1998 ,
於: Optics Letters. 23 ,
13 ,
p. 1010-1012 3 p. 研究成果: Article › 同行評審
phase matching
100%
coherent radiation
57%
predictions
50%
quantum efficiency
41%
tuning
35%
Wu, Y-C. ,
Feigelson, R. S. ,
Route, R. K. ,
Zheng, D. ,
Gordon, L. A. ,
Fejer, M. M. &
Byer, R. L. ,
15 5月 1998 ,
於: Journal of Applied Physics. 83 ,
10 ,
p. 5552-5554 3 p. 研究成果: Article › 同行評審
thermal stability
100%
wafers
85%
holders
84%
annealing
68%
harmonic generations
33%
Wu, Y-C. ,
Feigelson, R. S. ,
Route, R. K. ,
Zheng, D. ,
Gordon, L. A. ,
Fejer, M. M. &
Byer, R. L. ,
1 1月 1998 ,
於: Journal of the Electrochemical Society. 145 ,
1 ,
p. 366-371 6 p. 研究成果: Article › 同行評審
Interfacial Defect
100%
Harmonic generation
91%
Second-Harmonic Generation
69%
Optical losses
57%
Defects
41%
1997
Zheng, D. ,
Gordon, L. A. ,
Wu, Y-C. ,
Route, R. K. ,
Fejer, M. M. ,
Byer, R. L. &
Feigelson, R. S. ,
1 1月 1997 ,
於: Journal of the Electrochemical Society. 144 ,
4 ,
p. 1439-1441 3 p. 研究成果: Article › 同行評審
Nonlinear optics
100%
Diffusion bonding
72%
Wavelength
47%
Optical materials
43%
Optical losses
42%
1990
Shear Strength
100%
Coatings
64%
Strength
55%
Ceramic
44%
Cermets
44%