搜尋結果
2019
Huang, C. H. ,
Pakzad, A. ,
Lee, W-I. &
Chou, Y-C. ,
7 2月 2019 ,
於: Journal of Physical Chemistry C. 123 ,
5 ,
p. 3172-3179 8 p. 研究成果: Article › 同行評審
Strain relaxation
100%
Nanorods
87%
nanorods
58%
Masks
56%
Nanorod
50%
2018
Wu, S. Y. ,
Lang, L. W. ,
Cai, P. Y. ,
Chen, Y. W. ,
Lai, Y. L. ,
Lin, M. W. ,
Hsu, Y. J. ,
Lee, W-I. ,
Kuo, J. L. ,
Luo, M. F. &
Kuo, C. C. ,
1 1月 2018 ,
於: Physical Chemistry Chemical Physics. 20 ,
2 ,
p. 1261-1266 6 p. 研究成果: Article › 同行評審
dissociation
100%
Dissociation
87%
water
69%
molecules
65%
Photoemission
49%
2017
Wu, K. L. ,
Chou, Y. ,
Su, C. C. ,
Yang, C. C. ,
Lee, W-I. &
Chou, Y-C. ,
1 12月 2017 ,
於: Scientific reports. 7 ,
1 , 17942.
研究成果: Article › 同行評審
gallium nitride
100%
Nanowires
76%
Silicon
57%
Growth
23%
Organic Chemicals
8%
2016
Hsieh, T. E. ,
Lin, Y. C. ,
Chu, C. M. ,
Chuang, Y. L. ,
Huang, Y. X. ,
Shi, W. C. ,
Dee, C. F. ,
Majlis, B. Y. ,
Lee, W-I. &
Chang, E. Y. ,
1 7月 2016 ,
於: Journal of Electronic Materials. 45 ,
7 ,
p. 3285-3289 5 p. 研究成果: Article › 同行評審
High electron mobility transistors
100%
high electron mobility transistors
89%
Metals
55%
metals
44%
Metal
38%
Huang, W. C. ,
Chu, C. M. ,
Wong, Y. Y. ,
Chen, K. W. ,
Lin, Y. K. ,
Wu, C. H. ,
Lee, W-I. &
Chang, E. Y. ,
1 4月 2016 ,
於: Materials Science in Semiconductor Processing. 45 ,
p. 1-8 8 p. 研究成果: Article › 同行評審
Metallorganic chemical vapor deposition
100%
Buffer layers
90%
Sapphire
84%
metalorganic chemical vapor deposition
60%
sapphire
53%
Chu, C. M. ,
Lin, Y. C. ,
Lee, W-I. ,
Dee, C. F. ,
Wong, Y. Y. ,
Majlis, B. Y. ,
Salleh, M. M. ,
Yap, S. L. &
Chang, E. Y. ,
1 2月 2016 ,
於: Applied Physics Express. 9 ,
2 , 021203.
研究成果: Article › 同行評審
Oxide semiconductors
100%
metal oxide semiconductors
86%
capacitors
73%
Capacitors
66%
Electric breakdown
63%
Huang, W. C. ,
Chu, C. M. ,
Hsieh, C. F. ,
Wong, Y. Y. ,
Chen, K. W. ,
Lee, W-I. ,
Tu, Y. Y. ,
Chang, E. Y. ,
Dee, C. F. ,
Majlis, B. Y. &
Yap, S. L. ,
1 2月 2016 ,
於: Journal of Electronic Materials. 45 ,
2 ,
p. 859-866 8 p. 研究成果: Article › 同行評審
Metallorganic chemical vapor deposition
100%
Buffer layers
90%
Nucleation
66%
metalorganic chemical vapor deposition
60%
buffers
53%
2015
Huang, C. H. ,
Chen, K. J. ,
Tsai, M. T. ,
Shih, M. H. ,
Sun, C-W. ,
Lee, W-I. ,
Lin, C-C. &
Kuo, H-C. ,
21 4月 2015 ,
於: Journal of Photonics for Energy. 5 ,
1 ,
1 p. , 14087SS.
研究成果: Article › 同行評審
Chip scale packages
100%
Light emitting diodes
68%
Surface mount technology
60%
assembly
58%
light emitting diodes
54%
Chiu, C. H. ,
Lin, Y. W. ,
Tsai, M. T. ,
Lin, B. C. ,
Li, Z. Y. ,
Tu, P. M. ,
Huang, S. C. ,
Hsu, E. ,
Uen, W. Y. ,
Lee, W-I. &
Kuo, H-C. ,
15 3月 2015 ,
於: Journal of Crystal Growth. 414 ,
p. 258-262 5 p. 研究成果: Article › 同行評審
Nucleation
100%
Sapphire
95%
ultraviolet radiation
94%
Light emitting diodes
94%
light emitting diodes
75%
Yeh, Y. H. ,
Chu, C. M. ,
Wu, Y. H. ,
Hsu, Y. C. ,
Yu, T. Y. &
Lee, W-I. ,
1 8月 2015 ,
於: Semiconductor Science and Technology. 30 ,
8 , 085002.
研究成果: Article › 同行評審
Epitaxial films
100%
Stacking faults
94%
Epitaxial Film
93%
Stacking Fault
89%
Etching
70%
2014
Shieh, C. Y. ,
Tsai, M. T. ,
Li, Z. Y. ,
Kuo, H-C. ,
Chang, J. Y. ,
Chi, G. C. &
Lee, W-I. ,
1 1月 2014 ,
於: Journal of Nanophotonics. 8 ,
1 , 083081.
研究成果: Article › 同行評審
ultraviolet radiation
100%
Light emitting diodes
99%
Interface Roughness
87%
manufacturing
83%
light emitting diodes
79%
Tsai, M. T. ,
Chu, C. M. ,
Huang, C. H. ,
Wu, Y. H. ,
Chiu, C. H. ,
Li, Z. Y. ,
Tu, P. M. ,
Lee, W-I. &
Kuo, H-C. ,
1 12月 2014 ,
於: Nanoscale Research Letters. 9 ,
1 研究成果: Article › 同行評審
Quantum-Confined Stark Effect
100%
Interface Roughness
83%
ultraviolet radiation
47%
Light emitting diodes
47%
light emitting diodes
38%
Shih, C. H. ,
Lo, I. ,
You, S. T. ,
Tsai, C. D. ,
Tseng, B. H. ,
Chen, Y. F. ,
Chen, C. H. ,
Lee, C. H. ,
Lee, W-I. &
Hsu, G. Z. L. ,
1 12月 2014 ,
於: AIP Advances. 4 ,
12 , 127120.
研究成果: Article › 同行評審
thin films
100%
molecular beam epitaxy
55%
arcs
53%
microstructure
38%
curves
35%
2013
Wu, Y. H. ,
Lee, C. H. ,
Chu, C. M. ,
Yeh, Y. H. ,
Chen, C. L. &
Lee, W-I. ,
1 8月 2013 ,
於: Japanese Journal of Applied Physics. 52 ,
8 PART 2 , 08JB08.
研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Hydrides
71%
Thick films
69%
vapor phase epitaxy
58%
hydrides
57%
2011
Chen, K. M. ,
Wu, Y. H. ,
Yeh, Y. H. ,
Chiang, C. H. ,
Chen, K. Y. &
Lee, W-I. ,
1 3月 2011 ,
於: Journal of Crystal Growth. 318 ,
1 ,
p. 454-459 6 p. 研究成果: Article › 同行評審
Metallorganic vapor phase epitaxy
100%
Epilayers
96%
Metallorganic Chemical Vapour Deposition
91%
vapor phase epitaxy
59%
Surface treatment
44%
Yeh, Y. H. ,
Chen, K. M. ,
Wu, Y. H. ,
Hsu, Y. C. ,
Yu, T. Y. &
Lee, W-I. ,
15 11月 2011 ,
於: Journal of Crystal Growth. 333 ,
1 ,
p. 16-19 4 p. 研究成果: Article › 同行評審
Thick films
100%
Etching
88%
thick films
76%
Hydrogen
65%
etching
61%
Yeh, Y. H. ,
Chen, K. M. ,
Wu, Y. H. ,
Hsu, Y. C. &
Lee, W-I. ,
1 1月 2011 ,
於: Journal of Crystal Growth. 314 ,
1 ,
p. 9-12 4 p. 研究成果: Article › 同行評審
Etching
100%
Hydrogen
73%
etching
70%
hydrogen
57%
cavities
57%
2010
Chen, K. M. ,
Yeh, Y. H. ,
Wu, Y. H. ,
Chiang, C. H. ,
Yang, D. R. ,
Chao, C. L. ,
Chi, T. W. ,
Fang, Y. H. ,
Tsay, J. D. &
Lee, W-I. ,
1 12月 2010 ,
於: Journal of Crystal Growth. 312 ,
24 ,
p. 3574-3578 5 p. 研究成果: Article › 同行評審
Inductively coupled plasma
100%
Plasma etching
99%
Bending (forming)
93%
bows
76%
plasma etching
75%
Chen, K. M. ,
Yeh, Y. H. ,
Wu, Y. H. ,
Chiang, C. H. ,
Yang, D. R. ,
Gao, Z. S. ,
Chao, C. L. ,
Chi, T. W. ,
Fang, Y. H. ,
Tsay, J. D. &
Lee, W-I. ,
1 9月 2010 ,
於: Japanese Journal of Applied Physics. 49 ,
9 PART 1 , 091001.
研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Gallium nitride
78%
Hydrides
71%
gallium nitrides
65%
vapor phase epitaxy
58%
2009
Chen, K. M. ,
Huang, H. H. ,
Kuo, Y. L. ,
Wu, P. L. ,
Chu, T. L. ,
Yu, H. W. &
Lee, W. I. ,
1 5月 2009 ,
於: Journal of Crystal Growth. 311 ,
10 ,
p. 3037-3039 3 p. 研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Vapor Phase Epitaxy
89%
Bending (forming)
78%
Hydrides
71%
vapor phase epitaxy
58%
Huang, H. H. ,
Chao, C. L. ,
Chi, T. W. ,
Chang, Y. L. ,
Liu, P. C. ,
Tu, L. W. ,
Tsay, J. D. ,
Kuo, H-C. ,
Cheng, S-J. &
Lee, W-I. ,
1 5月 2009 ,
於: Journal of Crystal Growth. 311 ,
10 ,
p. 3029-3032 4 p. 研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Vapor Phase Epitaxy
89%
Hydrides
71%
Thick films
69%
vapor phase epitaxy
58%
2008
Huang, H. H. ,
Chen, K. M. ,
Tu, L. W. ,
Chu, T. L. ,
Wu, P. L. ,
Yu, H. W. ,
Chiang, C. H. &
Lee, W. I. ,
14 11月 2008 ,
於: Japanese Journal of Applied Physics. 47 ,
11 ,
p. 8394-8396 3 p. 研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Sapphire
75%
Hydrides
71%
Thick films
69%
vapor phase epitaxy
58%
Ho, Y. T. ,
Liang, M. H. ,
Hsiao, F. K. ,
Wang, W. L. ,
Peng, C. Y. ,
Chen, W. D. ,
Lee, W-I. &
Chang, L. ,
1 4月 2008 ,
於: Journal of Crystal Growth. 310 ,
7-9 ,
p. 1614-1618 5 p. 研究成果: Article › 同行評審
Reflection high energy electron diffraction
100%
Nitrogen plasma
88%
Reflection High Energy Electron Diffraction
78%
Pulsed laser deposition
75%
Buffer layers
69%
Huang, H. H. ,
Wu, P. L. ,
Zeng, H. Y. ,
Liu, P. C. ,
Chi, T. W. ,
Tsay, J. D. &
Lee, W-I. ,
2 6月 2008 ,
於: Journal of the Electrochemical Society. 155 ,
7 研究成果: Article › 同行評審
Wet etching
100%
Etching
64%
Tunnels
60%
Thick films
29%
Activation energy
24%
2007
Chen, J-F. ,
Ke, C. T. ,
Hsieh, P. C. ,
Chiang, C. H. ,
Lee, W-I. &
Lee, S. C. ,
2 8月 2007 ,
於: Journal of Applied Physics. 101 ,
12 , 123515.
研究成果: Article › 同行評審
metalorganic chemical vapor deposition
100%
quantum wells
40%
valence
28%
conduction bands
11%
energy levels
10%
contact resistance
100%
indium oxides
94%
tin oxides
92%
interlayers
87%
mass spectroscopy
15%
Wet etching
100%
Sapphire
95%
tunnels
67%
Etching
64%
Vapor phase epitaxy
63%
Nitrides
100%
Electrostatics
88%
Light emitting diodes
81%
nitrides
76%
Electrostatic discharge
72%
2006
Huang, H. H. ,
Zeng, H. Y. ,
Lee, C. L. ,
Lee, S. C. &
Lee, W-I. ,
23 11月 2006 ,
於: Applied Physics Letters. 89 ,
20 , 202115.
研究成果: Article › 同行評審
vapor phase epitaxy
100%
hydrides
97%
metalorganic chemical vapor deposition
91%
tunnels
89%
sapphire
81%
masking
100%
Light emitting diodes
89%
light emitting diodes
71%
Metallorganic chemical vapor deposition
23%
Semiconductor quantum wells
23%
2005
Lee, J. R. ,
Lu, C. R. ,
Lee, W-I. &
Lee, S. C. ,
1 1月 2005 ,
於: Physica E: Low-Dimensional Systems and Nanostructures. 25 ,
4 ,
p. 562-568 7 p. 研究成果: Article › 同行評審
Photoluminescence
100%
Wetting
62%
Quantum Dot
54%
quantum dots
47%
Electron energy levels
47%
Chen, J-F. ,
Hsiao, R. S. ,
Hsieh, M. T. ,
Huang, W. D. ,
Guo, P. S. ,
Lee, W-I. ,
Lee, S. C. &
Lee, C. L. ,
11 10月 2005 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 44 ,
10 ,
p. 7507-7511 5 p. 研究成果: Article › 同行評審
Deep level transient spectroscopy
100%
conduction
56%
Diodes
51%
Capacitance
48%
Electric potential
43%
2003
Lee, J. R. ,
Chen, Y. Y. ,
Lu, C. R. ,
Lee, W-I. &
Lee, S. C. ,
25 7月 2003 ,
於: Materials Science and Engineering B: Solid-State Materials for Advanced Technology. 100 ,
3 ,
p. 248-251 4 p. 研究成果: Article › 同行評審
Semiconductor quantum wells
100%
Energy gap
54%
quantum wells
49%
Subband
30%
Energy
30%
Wu, H. R. ,
Lee, K. W. ,
Nian, T. B. ,
Chou, D. W. ,
Huang Wu, J. J. ,
Wang, Y. H. ,
Houng, M. P. ,
Sze, P. W. ,
Su, Y. K. ,
Chang, S. J. ,
Ho, C. H. ,
Chiang, C. I. ,
Chern, Y. T. ,
Juang, F. S. ,
Wen, T. C. ,
Lee, W-I. &
Chyi, J. I. ,
29 4月 2003 ,
於: Materials Chemistry and Physics. 80 ,
1 ,
p. 329-333 5 p. 研究成果: Article › 同行評審
Silicon Dioxide
100%
Silica
84%
liquid phases
69%
silicon dioxide
62%
Liquids
54%
Lee, C. C. ,
Lee, C. P. ,
Yeh, M. H. ,
Lee, W-I. &
Kuo, C. T. ,
1 7月 2003 ,
於: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21 ,
4 ,
p. 1501-1504 4 p. 研究成果: Article › 同行評審
Ohmic contacts
100%
low resistance
75%
Plasmas
60%
electric contacts
58%
Gases
37%
Lee, C. C. ,
Lin, S-D. ,
Lee, C. P. ,
Yeh, M. H. ,
Lee, W-I. &
Kuo, C. T. ,
4月 2003 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 42 ,
4 B ,
p. 2313-2315 3 p. 研究成果: Article › 同行評審
Ohmic contacts
100%
Thermodynamic stability
68%
Plasmas
60%
electric contacts
58%
thermal stability
57%
2002
Wen, T. C. ,
Lee, W-I. ,
Sheu, J. K. &
Chi, G. C. ,
1 4月 2002 ,
於: Solid-State Electronics. 46 ,
4 ,
p. 555-558 4 p. 研究成果: Article › 同行評審
Wet etching
100%
Etching
77%
Scanning electron microscopy
56%
etching
54%
Surface topography
43%
2001
Wen, T. C. ,
Lee, S. C. ,
Lee, W-I. ,
Chen, T. Y. ,
Chan, S. H. &
Tsang, J. S. ,
15 5月 2001 ,
於: Japanese Journal of Applied Physics, Part 2: Letters. 40 ,
5 B ,
p. L495-L497 研究成果: Article › 同行評審
Chemical activation
100%
Oxygen
90%
activation
88%
oxygen
67%
Nitrogen
44%
Wen, T. C. ,
Lee, W-I. ,
Sheu, J. K. &
Chi, G. C. ,
1 3月 2001 ,
於: Solid-State Electronics. 45 ,
3 ,
p. 427-430 4 p. 研究成果: Article › 同行評審
Metallorganic chemical vapor deposition
100%
Photoluminescence
68%
Annealing
62%
metalorganic chemical vapor deposition
60%
Chemical Vapour Deposition
57%
Photoluminescence
100%
Growth temperature
99%
Semiconductor quantum wells
96%
Blue shift
59%
Wavelength
54%
2000
barrier layers
100%
Oxidation
81%
oxidation
67%
Photoluminescence
49%
Secondary ion mass spectrometry
46%
Sung, W. J. ,
Wu, Y. R. ,
Lee, S. C. ,
Wen, T. C. ,
Li, T. J. ,
Chang, J. T. &
Lee, W-I. ,
15 6月 2000 ,
於: Japanese Journal of Applied Physics, Part 2: Letters. 39 ,
6 B ,
p. L567-L568 研究成果: Article › 同行評審
Vacancies
100%
Phosphorus
89%
phosphorus
72%
Molar ratio
58%
Deep level transient spectroscopy
43%
1999
Wu, Y. R. ,
Sung, W. J. ,
Wen, T. C. ,
Lee, S. C. &
Lee, W-I. ,
15 8月 1999 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 38 ,
8 B ,
p. 4720-4721 2 p. 研究成果: Article › 同行評審
Doping (additives)
100%
Defects
61%
Deep level transient spectroscopy
53%
defects
49%
Organic chemicals
46%
majority carriers
100%
minority carriers
82%
traps
58%
metalorganic chemical vapor deposition
14%
activation energy
11%
Wu, Y. R. ,
Sung, W. J. ,
Lee, S. C. ,
Li, T. J. &
Lee, W-I. ,
15 7月 1999 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 38 ,
7 B ,
p. 4049-4050 2 p. 研究成果: Article › 同行評審
Doping (additives)
100%
Organic chemicals
69%
Chemical vapor deposition
52%
Activation energy
46%
traps
33%
1998
Molecular beam epitaxy
100%
Arsenic
95%
Molecular Beam Epitaxy
92%
Lattice Constant
71%
arsenic
69%
Su, Z. A. ,
Huang, J. H. ,
Hsieh, L. Z. &
Lee, W-I. ,
1 12月 1998 ,
於: Applied Physics Letters. 72 ,
16 ,
p. 1984-1986 3 p. 研究成果: Article › 同行評審
arsenic
100%
molecular beam epitaxy
78%
transmission electron microscopy
20%
annealing
18%
microstructure
18%
1997
Integrated circuits
100%
Defects
74%
Neural networks
65%
1996
Chen, J-F. ,
Chen, N. C. ,
Huang, W. Y. ,
Lee, W-I. &
Feng, M. S. ,
1 7月 1996 ,
於: Japanese Journal of Applied Physics, Part 2: Letters. 35 ,
7 PART A ,
p. L810-L812 3 p. 研究成果: Article › 同行評審
Vapor phase epitaxy
100%
Organometallics
85%
Capacitance
48%
Lighting
45%
capacitance
45%
Deep level transient spectroscopy
100%
Zinc oxide
74%
zinc oxides
54%
Defects
38%
ceramics
37%