每年研究成果
每年研究成果
- 2結果
搜尋結果
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2023
Erratum: Low-Temperature Microwave Annealing Processes for Future IC Fabrication - A Review (IEEE Trans. Electron Devices (2014) 61:3 (651–665) DOI: 10.1109/TED.2014.2300898)
Lee, Y. J., Cho, T. C., Chuang, S. S., Hsueh, F. K., Lu, Y. L., Sung, P. J., Chen, H. C., Current, M. I., Tseng, T.-Y., Chao, T. S., Hu, C. & Yang, F. L., 1 7月 2023, 於: IEEE Transactions on Electron Devices. 70, 7, p. 3983 1 p.研究成果: Comment/debate
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Erratum: Susceptor Coupling for the Uniformity and Dopant Activation Efficiency in Implanted Si Under Fixed-Frequency Microwave Anneal (IEEE Electron Device Lett. (2012) 33:2 (248–250) DOI: 10.1109/LED.2011.2176100)
Lee, Y. J., Hsueh, F. K., Current, M. I., Wu, C. Y. & Chao, T. S., 1 6月 2023, 於: Ieee Electron Device Letters. 44, 6, p. 1015 1 p.研究成果: Comment/debate
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