搜尋結果
2004
Chang, T. C. ,
Van, S. T. ,
Yang, F. M. ,
Liu, P-T. &
Sze, S. M. ,
22 3月 2004 ,
於: Applied Physics Letters. 84 ,
12 ,
p. 2094-2096 3 p. 研究成果: Article › 同行評審
silicon carbides
100%
oxides
64%
oxygen
62%
electrical faults
25%
trapping
19%
Chang, T. C. ,
Tsai, T. M. ,
Liu, P-T. ,
Yan, S. T. ,
Chang, Y. C. ,
Aoki, H. ,
Sze, S. M. &
Tseng, T-Y. ,
1 5月 2004 ,
於: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22 ,
3 ,
p. 1196-1201 6 p. 研究成果: Article › 同行評審
Chemical mechanical polishing
100%
Polishing
84%
polishing
80%
Plasmas
28%
Surface treatment
16%
Liu, P-T. ,
Chen, C. W. ,
Chang, T. C. &
Tseng, T-Y. ,
8 4月 2004 ,
於: Electrochemical and Solid-State Letters. 7 ,
2 ,
p. F5-F7 3 p. 研究成果: Article › 同行評審
Photoresists
100%
stripping
87%
photoresists
83%
Nanoporosity
73%
Gelation
54%
Chang, T. C. ,
Yan, S. T. ,
Liu, P-T. ,
Chen, C. W. ,
Wu, H. H. &
Sze, S. M. ,
12 7月 2004 ,
於: Applied Physics Letters. 85 ,
2 ,
p. 248-250 3 p. 研究成果: Article › 同行評審
silicon nitrides
100%
cells
55%
silicon
55%
trapping
39%
Chang, T. C. ,
Yan, S. T. ,
Liu, P-T. ,
Chen, C. W. ,
Wu, H. H. &
Sze, S. M. ,
1 12月 2004 ,
於: Journal of the Electrochemical Society. 151 ,
12 ,
p. G805-G808 4 p. 研究成果: Article › 同行評審
Voltage
100%
Models (Physical)
94%
Memory Effect
88%
Data storage equipment
84%
Resonant tunneling
78%
Zan, H-W. ,
Chang, T. C. ,
Shih, P. S. ,
Peng, D. Z. ,
Kuo, P. Y. ,
Huang, T. Y. ,
Chang, C. Y. &
Liu, P-T. ,
8 4月 2004 ,
於: Electrochemical and Solid-State Letters. 7 ,
2 ,
p. G31-G33 3 p. 研究成果: Article › 同行評審
Thin film transistors
100%
Polysilicon
90%
Tungsten
84%
Polycrystalline Solid
69%
tungsten
66%
Wang, J. H. ,
Liu, P-T. ,
Chang, T. S. ,
Chang, T. C. &
Chen, L. J. ,
22 12月 2004 ,
於: Thin Solid Films. 469-470 ,
SPEC. ISS. ,
p. 393-397 5 p. 研究成果: Article › 同行評審
Surface chemistry
100%
Metallizing
88%
Permittivity
76%
Surface Chemistry
69%
Dielectric Constant
69%
Chen, C. W. ,
Chang, T. C. ,
Liu, P-T. ,
Tsai, T. M. ,
Wu, H. H. &
Tseng, T-Y. ,
22 12月 2004 ,
於: Thin Solid Films. 469-470 ,
SPEC. ISS. ,
p. 377-382 6 p. 研究成果: Article › 同行評審
Etching
100%
Silica
95%
Nanoporosity
87%
Plasmas
85%
silicon dioxide
70%
Chang, T. C. ,
Yan, S. T. ,
Liu, P-T. ,
Chen, C. W. ,
Wu, Y. C. &
Sze, S. M. ,
16 6月 2004 ,
於: Electrochemical and Solid-State Letters. 7 ,
6 ,
p. G113-G115 3 p. 研究成果: Article › 同行評審
Plasma CVD
100%
Plasma Chemical Vapour Deposition
74%
Silicon nitride
66%
silicon nitrides
53%
plasma density
53%
Chang, T. C. ,
Tsai, T. M. ,
Liu, P-T. ,
Chen, C. W. &
Tseng, T-Y. ,
22 12月 2004 ,
於: Thin Solid Films. 469-470 ,
SPEC. ISS. ,
p. 383-387 5 p. 研究成果: Article › 同行評審
Electron beams
100%
Electron Beam
91%
curing
89%
Curing
79%
Glass
67%
2003
Peng, D. Z. ,
Chang, T. C. ,
Liu, C. F. ,
Yeh, P. H. ,
Liu, P-T. &
Chang, C. Y. ,
3月 2003 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 42 ,
3 ,
p. 1164-1167 4 p. 研究成果: Article › 同行評審
Ultrahigh vacuum
100%
Thin film transistors
81%
Chemical vapor deposition
74%
Polysilicon
73%
Electric breakdown
71%
Zan, H-W. ,
Chang, T. C. ,
Shih, P. S. ,
Peng, D. Z. ,
Kuo, P. Y. ,
Huang, T. Y. ,
Chang, C. Y. &
Liu, P-T. ,
1 8月 2003 ,
於: IEEE Electron Device Letters. 24 ,
8 ,
p. 509-511 3 p. 研究成果: Article › 同行評審
Parasitic
100%
Polysilicon
93%
Tungsten
87%
Polycrystalline Solid
72%
Resistance
51%
Peng, D. Z. ,
Chang, T. C. ,
Chang, C. Y. ,
Tsai, M. L. ,
Tu, C. H. &
Liu, P-T. ,
15 2月 2003 ,
於: Journal of Applied Physics. 93 ,
4 ,
p. 1926-1932 7 p. 研究成果: Article › 同行評審
transistors
100%
degradation
94%
silicon
67%
thin films
64%
crystallization
57%
Liu, P-T. ,
Chang, T. C. ,
Tsai, T. M. ,
Lin, Z. W. ,
Chen, C. W. ,
Chen, B. C. &
Sze, S. M. ,
17 11月 2003 ,
於: Applied Physics Letters. 83 ,
20 ,
p. 4226-4228 3 p. 研究成果: Article › 同行評審
silicates
100%
electron beams
73%
permittivity
71%
moisture
55%
photoresists
54%
Chang, T. C. ,
Tsai, T. M. ,
Liu, P-T. ,
Mor, Y. S. ,
Chen, C. W. ,
Sheu, J-T. &
Tseng, T-Y. ,
1 5月 2003 ,
於: Electrochemical and Solid-State Letters. 6 ,
5 研究成果: Article › 同行評審
Silsesquioxane
100%
X rays
73%
Hydrogen
64%
Dielectric Material
53%
Photoresists
51%
Liu, P-T. ,
Chang, T. C. ,
Yan, S. T. ,
Li, C. H. &
Sze, S. M. ,
1 2月 2003 ,
於: Journal of the Electrochemical Society. 150 ,
2 研究成果: Article › 同行評審
Aromatic hydrocarbons
100%
Transport Phenomena
88%
Capacitor
70%
Arene
55%
Polymers
50%
Chang, T. C. ,
Chen, C. W. ,
Liu, P-T. ,
Mor, Y. S. ,
Tsai, H. M. ,
Tsai, T. M. ,
Yan, S. T. ,
Tu, C. H. ,
Tseng, T-Y. &
Sze, S. M. ,
1 4月 2003 ,
於: Electrochemical and Solid-State Letters. 6 ,
4 研究成果: Article › 同行評審
moisture
100%
Leakage Current
81%
Moisture
80%
Glass
74%
Leakage currents
66%
Peng, D. Z. ,
Chang, T. C. ,
Shih, P. S. ,
Zan, H-W. ,
Huang, T. Y. ,
Chang, C. Y. &
Liu, P-T. ,
16 12月 2003 ,
於: Applied Physics Letters. 81 ,
25 ,
p. 4763-4765 3 p. 研究成果: Article › 同行評審
transistors
100%
silicon
67%
thin films
64%
ultrahigh vacuum
41%
gas flow
38%
Wang, J. H. ,
Chen, W. J. ,
Chang, T. C. ,
Liu, P-T. ,
Cheng, S. L. ,
Lin, J. Y. &
Chen, L. J. ,
1 8月 2003 ,
於: Journal of the Electrochemical Society. 150 ,
8 ,
p. F141-F146 6 p. 研究成果: Article › 同行評審
Silsesquioxane
100%
Metallizing
94%
Permittivity
81%
Hydrogen
64%
Porosity
47%
2002
Zan, H-W. ,
Peng, D. Z. ,
Shih, P. S. ,
Chang, T. C. ,
Liu, P-T. &
Chang, C. Y. ,
26 9月 2002 ,
於: Vacuum. 67 ,
3-4 ,
p. 595-598 4 p. 研究成果: Article › 同行評審
spacers
100%
Polycrystalline Solid
85%
Transconductance
74%
Polysilicon
55%
Behavior as Electrode
48%
Liu, P-T. ,
Chang, T. C. ,
Hsu, K. C. ,
Tseng, T-Y. ,
Chen, L. M. ,
Wang, C. J. &
Sze, S. M. ,
1 7月 2002 ,
於: Thin Solid Films. 414 ,
1 ,
p. 1-6 6 p. 研究成果: Article › 同行評審
Low-k dielectric
100%
Silicates
77%
Thermodynamic stability
69%
silicates
65%
Dielectric Material
59%
Liu, P-T. ,
Chang, T. C. ,
Mor, Y. S. ,
Chen, C. W. ,
Tsai, T. M. ,
Chu, C. J. ,
Pan, F-M. &
Szea, S. M. ,
1 3月 2002 ,
於: Electrochemical and Solid-State Letters. 5 ,
3 研究成果: Article › 同行評審
Ashing
100%
Plasmas
72%
oxygen plasma
68%
Oxygen
63%
Glass
62%
Huang, C. H. ,
Tseng, T-Y. ,
Chien, C-H. ,
Yang, M. J. ,
Leu, C. C. ,
Chang, T. C. ,
Liu, P-T. &
Huang, T. Y. ,
2 12月 2002 ,
於: Thin Solid Films. 420-421 ,
p. 377-381 5 p. 研究成果: Article › 同行評審
Buffer layers
100%
Ferroelectric materials
92%
Sol-gels
92%
Electric properties
74%
Semiconductor materials
62%
Gau, W. C. ,
Wu, C. W. ,
Chang, T. C. ,
Liu, P-T. ,
Chu, C. J. ,
Chen, C. H. &
Chen, L. J. ,
2 12月 2002 ,
於: Thin Solid Films. 420-421 ,
p. 548-552 5 p. 研究成果: Article › 同行評審
Organic chemicals
100%
Diffusion barriers
95%
Diffusion Barrier
81%
Chemical vapor deposition
75%
Metallizing
75%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Mei, Y. J. ,
Pan, F-M. ,
Wu, W. F. &
Sze, S. M. ,
4月 2002 ,
於: Microelectronic Engineering. 60 ,
3-4 ,
p. 469-475 7 p. 研究成果: Article › 同行評審
Organic polymers
100%
siloxanes
83%
Passivation
77%
Siloxane
66%
Chemical Passivation
64%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Mei, Y. J. &
Sze, S. M. ,
1 8月 2002 ,
於: Journal of the Electrochemical Society. 149 ,
8 研究成果: Article › 同行評審
Organic polymers
100%
Hexamethyldisilazane
85%
Dielectric losses
81%
Photoresists
81%
Dielectric Loss
73%
Peng, D. Z. ,
Chang, T. C. ,
Zan, H-W. ,
Huang, T. Y. ,
Chang, C. Y. &
Liu, P-T. ,
24 6月 2002 ,
於: Applied Physics Letters. 80 ,
25 ,
p. 4780-4782 3 p. 研究成果: Article › 同行評審
transistors
100%
furnaces
68%
silicon
67%
thin films
64%
leakage
62%
Chang, T. C. ,
Tsai, T. M. ,
Liu, P-T. ,
Mor, Y. S. ,
Chen, C. W. ,
Mei, Y. J. ,
Sheu, J-T. &
Tseng, T-Y. ,
2 12月 2002 ,
於: Thin Solid Films. 420-421 ,
p. 403-407 5 p. 研究成果: Article › 同行評審
Organic polymers
100%
Polymer films
84%
siloxanes
83%
Photoresists
64%
X rays
57%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Chu, C. J. ,
Pan, F-M. ,
Lur, W. &
Szeb, S. M. ,
1 10月 2002 ,
於: Journal of the Electrochemical Society. 149 ,
10 研究成果: Article › 同行評審
Photoresists
100%
Silica
80%
Permittivity
78%
Dielectric Constant
71%
Ashing
50%
2001
Chang, T. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Mei, Y. J. &
Sze, S. M. ,
1 12月 2001 ,
於: Japanese Journal of Applied Physics, Part 2: Letters. 40 ,
12 A ,
p. L1311-L1313 研究成果: Article › 同行評審
Plasmas
100%
Hydrogen
86%
damage
77%
hydrogen
66%
Photoresists
55%
Chang, T. C. ,
Liu, P-T. ,
Tsai, T. M. ,
Yeh, F. S. ,
Tseng, T-Y. ,
Tsai, M. S. ,
Chen, B. C. ,
Yang, Y. L. &
Sze, S. M. ,
5月 2001 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 40 ,
5R ,
p. 3143-3146 4 p. 研究成果: Article › 同行評審
Chemical mechanical polishing
100%
elimination
75%
Hydrogen
61%
degradation
57%
Degradation
53%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Mei, Y. J. &
Sze, S. M. ,
11月 2001 ,
於: Thin Solid Films. 398 ,
399 ,
p. 523-526 4 p. 研究成果: Article › 同行評審
Silsesquioxane
100%
Hydrogen
64%
damage
58%
Resistance
51%
hydrogen
50%
Liu, P-T. ,
Chang, T. C. ,
Su, H. ,
Mor, Y. S. ,
Yang, Y. L. ,
Chung, H. ,
Hou, J. &
Sze, S. M. ,
1 12月 2001 ,
於: Journal of the Electrochemical Society. 148 ,
2 研究成果: Article › 同行評審
Organic polymers
100%
Plasmas
58%
Photoresists
54%
Plasma
39%
Dielectric Material
37%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Sze, S. M. &
Mei, Y. J. ,
11月 2001 ,
於: Thin Solid Films. 398 ,
399 ,
p. 637-640 4 p. 研究成果: Article › 同行評審
Boron
100%
Permittivity
88%
Dielectric Constant
80%
Boron Atom
76%
boron
75%
Chang, T. C. ,
Mor, Y. S. ,
Liu, P-T. ,
Tsai, T. M. ,
Chen, C. W. ,
Mei, Y. J. &
Sze, S. M. ,
11月 2001 ,
於: Thin Solid Films. 398 ,
399 ,
p. 632-636 5 p. 研究成果: Article › 同行評審
Organic polymers
100%
siloxanes
83%
Photoresists
81%
stripping
71%
Polymer films
70%
2000
Liu, P-T. ,
Chang, T. C. ,
Yang, Y. L. ,
Cheng, Y. F. &
Sze, S. M. ,
1 9月 2000 ,
於: IEEE Transactions on Electron Devices. 47 ,
9 ,
p. 1733-1739 7 p. 研究成果: Article › 同行評審
Nitridation
100%
Silsesquioxane
79%
Plasmas
59%
Copper
52%
Hydrogen
51%
Chang, T. C. ,
Liu, P-T. ,
Yang, Y. L. ,
Hu, J. C. &
Sze, S. M. ,
2月 2000 ,
於: Japanese Journal of Applied Physics, Part 2: Letters. 39 ,
2 A 研究成果: Article › 同行評審
Vapors
100%
vapors
84%
augmentation
68%
Grain boundaries
45%
Secondary ion mass spectrometry
33%
Liu, P-T. ,
Chang, T. C. ,
Huang, M. C. ,
Yang, Y. L. ,
Mor, Y. S. ,
Tsai, M. S. ,
Chung, H. ,
Hou, J. &
Sze, S. M. ,
1 11月 2000 ,
於: Journal of the Electrochemical Society. 147 ,
11 ,
p. 4313-4317 5 p. 研究成果: Article › 同行評審
Dangling Bond
100%
Chemical mechanical polishing
98%
Chemical Passivation
76%
Dielectric Property
76%
Dielectric Material
66%
Liu, P-T. ,
Chang, T. C. ,
Yang, Y. L. ,
Cheng, Y. F. ,
Lee, J. K. ,
Shih, F. Y. ,
Tsai, E. ,
Chen, G. &
Sze, S. M. ,
1 3月 2000 ,
於: Journal of the Electrochemical Society. 147 ,
3 ,
p. 1186-1192 7 p. 研究成果: Article › 同行評審
Deuterium
100%
Silsesquioxane
85%
Electric properties
73%
Plasmas
64%
Deuterium(.)
63%
Liu, P-T. ,
Chang, T. C. ,
Hu, J. C. ,
Yang, Y. L. &
Sze, S. M. ,
1 1月 2000 ,
於: Journal of the Electrochemical Society. 147 ,
1 ,
p. 368-372 5 p. 研究成果: Article › 同行評審
Diffusion barriers
100%
Titanium nitride
96%
Diffusion Barrier
85%
Metallizing
78%
Nitride
65%
1999
Liu, P-T. ,
Chang, TC. ,
Yang, YL. ,
Cheng, YF. ,
Shih, FY. ,
Lee, JK. ,
Tsai, E. &
Sze, SM. ,
11月 1999 ,
於: Japanese Journal of Applied Physics. 38 ,
11 ,
p. 6247-6252 6 p. 研究成果: Article › 同行評審
Copper
100%
Hydrogen
97%
copper
87%
hydrogen plasma
83%
hydrogen
75%
Chang, TC. ,
Liu, P-T. ,
Mei, YJ. ,
Mor, YS. ,
Perng, TH. ,
Yang, YL. &
Sze, SM. ,
3月 1999 ,
於: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17 ,
5 ,
p. 2325-2330 6 p. 研究成果: Article › 同行評審
Permittivity
100%
Plasmas
91%
Copper
48%
Hydrogen
31%
Low-k dielectric
29%
Chang, T. C. ,
Liu, P-T. ,
Shih, F. Y. &
Sze, S. M. ,
1 8月 1999 ,
於: Electrochemical and Solid-State Letters. 2 ,
8 ,
p. 390-392 3 p. 研究成果: Article › 同行評審
Silsesquioxane
100%
Chemical properties
91%
Electric properties
86%
chemical properties
85%
Dielectric Material
71%
Liu, P-T. ,
Chang, T. C. ,
Mor, Y. S. &
Sze, S. M. ,
6月 1999 ,
於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 38 ,
6 A ,
p. 3482-3486 5 p. 研究成果: Article › 同行評審
oxygen plasma
100%
Plasmas
78%
Oxygen
69%
Photoresists
43%
stripping
38%
Chang, T. C. ,
Liu, P-T. ,
Mor, Y. S. ,
Sze, S. M. ,
Yang, Y. L. ,
Feng, M. S. ,
Pan, F-M. ,
Dai, B. T. &
Chang, C. Y. ,
1 1月 1999 ,
於: Journal of the Electrochemical Society. 146 ,
10 ,
p. 3802-3806 5 p. 研究成果: Article › 同行評審
Permittivity
100%
Plasmas
91%
Dielectric Constant
91%
Plasma
61%
Chemical Passivation
40%
1998
Cylinder
100%
Electromagnetic waves
99%
Conductor
94%
Scattering
88%
Wave
87%
Liu, P-T. ,
Chang, T. C. ,
Sze, S. M. ,
Pan, F-M. ,
Mei, Y. J. ,
Wu, W. F. ,
Tsai, M. S. ,
Dai, B. T. ,
Chang, C. Y. ,
Shih, F. Y. &
Huang, H. D. ,
2 11月 1998 ,
於: Thin Solid Films. 332 ,
1-2 ,
p. 345-350 6 p. 研究成果: Article › 同行評審
Silsesquioxane
100%
Permittivity
81%
Plasmas
75%
Dielectric Constant
74%
Hydrogen
64%
1996
Electromagnetic waves
100%
image reconstruction
98%
Image reconstruction
97%
Permittivity
94%
conductors
77%
Image reconstruction
100%
Genetic algorithms
68%
Integral equations
51%
Imaging techniques
36%
Boundary conditions
36%