搜尋結果
2007
circuit protection
100%
CMOS integrated circuits
86%
integrated circuits
56%
Integrated circuits
55%
CMOS
53%
Electric potential
100%
Oxides
47%
Networks (circuits)
15%
Inductor
100%
Capacitance
58%
Application
21%
Modification
19%
MOSFET devices
100%
Simulation
81%
Electric potential
66%
Cathodes
42%
Anodes
41%
Ho, W. J. ,
Chen, J. S. ,
Ker, M-D. ,
Wu, T-K. ,
Wu, C-Y. ,
Yang, Y-S. ,
Li, Y-K. &
Yuan, C-J. ,
15 6月 2007 ,
於: Biosensors and Bioelectronics. 22 ,
12 ,
p. 3008-3013 6 p. 研究成果: Article › 同行評審
Biosensors
100%
Biosensing Techniques
99%
Glucose
69%
Fabrication
60%
Horseradish Peroxidase
35%
Thyristors
100%
Electric potential
21%
Threshold voltage
15%
analog circuits
100%
Bias voltage
88%
Polysilicon
81%
Analog circuits
79%
Threshold voltage
77%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Vacuum
56%
Display devices
48%
Electric potential
32%
Electrostatic Discharge
100%
Electrostatic discharge
83%
clamps
77%
rails
75%
Clamping devices
71%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Implant
63%
Electric potential
32%
Electric lines
32%
Diode amplifiers
100%
Oxides
47%
Diodes
30%
Electric potential
28%
Application
17%
CMOS integrated circuits
100%
Damping
52%
Simulation
43%
Electrostatic Discharge
36%
Electrostatic discharge
12%
Charge pump circuits
100%
Polysilicon
73%
Diodes
58%
Electric potential
32%
Electric breakdown
23%
2006
Germanium
100%
Leakage Current
98%
Leakage currents
80%
Resistors
72%
Diodes
68%
Electrostatic Discharge
100%
Level measurement
86%
Electrostatic discharge
83%
Limiting Current
77%
Resistance
40%
Charge pump circuits
100%
Oxides
54%
Electric potential
32%
Charge transfer
20%
Electric breakdown
17%
Electric potential
100%
Electric breakdown
36%
Oxides
27%
Electrostatic discharge
100%
Clamping devices
85%
Rails
65%
Networks (circuits)
42%
Electric potential
39%
Electrostatic Discharge
100%
Leakage Current
84%
Electrostatic discharge
83%
Leakage currents
68%
CMOS
57%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Clamping devices
23%
Rails
13%
Diodes
9%
Thin film devices
100%
Electrostatic Discharge
93%
Electrostatic discharge
78%
Polysilicon
69%
layouts
62%
Electrostatic discharge
100%
CMOS
68%
immunity
67%
electrostatics
58%
filters
54%
failure analysis
100%
Parasitic
91%
controllers
75%
Diodes
68%
CMOS
66%
Energy gap
100%
Compensation and Redress
67%
Electric potential
45%
Bipolar transistors
36%
Temperature
23%
Polysilicon
100%
buffers
73%
Compensation and Redress
66%
Buffer Solution
56%
Thin film transistors
55%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Static Electricity
75%
Radio
65%
radio frequencies
55%
Electrostatic discharge
100%
Networks (circuits)
42%
Electric potential
39%
Oxides
21%
Clamping devices
14%
Substrates
100%
Transistors
48%
Bipolar transistors
34%
Oxides
24%
2005
Energy gap
100%
Threshold voltage
96%
Band Gap
66%
Voltage
63%
Networks (circuits)
48%
Trigger circuits
100%
Electric potential
32%
Oxides
27%
Threshold voltage
17%
Networks (circuits)
8%
Electrostatic discharge
100%
electrostatics
58%
broadband
53%
Networks (circuits)
42%
circuit protection
9%
Electrostatic Discharge
100%
Electrostatic discharge
83%
layouts
67%
CMOS
57%
chips
50%
distributed amplifiers
100%
Electrostatic discharge
80%
CMOS
55%
electrostatics
47%
human body
14%
Electrostatic discharge
100%
Clamping devices
85%
Thyristors
79%
Rails
65%
Silicon
12%
Electrostatic discharge
100%
Substrates
53%
Networks (circuits)
42%
Electric potential
39%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Failure modes
56%
Electric potential
32%
Voltage
11%
Leakage Current
100%
Leakage currents
81%
Seals
71%
CMOS
68%
rings
52%
Diodes
100%
Block Like Crystal
73%
Oxide
58%
Networks (circuits)
29%
Oxides
23%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Oxide semiconductors
75%
Thyristors
66%
Metal Oxide
53%
Electrostatic Discharge
100%
CMOS integrated circuits
92%
Electrostatic discharge
83%
Thyristors
66%
Voltage
23%
Electrostatic Discharge
100%
Electrostatic discharge
83%
Simulation
40%
Parasitic
39%
Voltage
23%
Electrostatic Discharge
100%
silicon controlled rectifiers
97%
dummies
86%
Electrostatic discharge
83%
Thyristors
66%
Clamping devices
100%
Liquid crystal displays
96%
Rails
75%
Networks (circuits)
49%
Electric potential
45%
2004
Solder
100%
Capacitor
82%
Scanning Electron Microscopy
48%
Soldering alloys
26%
Capacitors
21%
Electrostatic discharge
100%
Oxide semiconductors
90%
CMOS
68%
chips
60%
electrostatics
58%
Electrostatic discharge
100%
Clamping devices
12%
Leakage currents
11%
Diodes
10%
Networks (circuits)
6%
Huang, C. Y. ,
Chen, W. F. ,
Chuan, S. Y. ,
Chiu, F. C. ,
Tseng, J. C. ,
Lin, I. C. ,
Chao, C. J. ,
Leu, L. Y. &
Ker, M-D. ,
1 2月 2004 ,
於: Microelectronics Reliability. 44 ,
2 ,
p. 213-221 9 p. 研究成果: Article › 同行評審
Parasitic
100%
design optimization
99%
silicon controlled rectifiers
92%
Thyristors
84%
Voltage
58%
Electrostatic Discharge
100%
Voltage
92%
Electric potential
65%
Simulation
40%
Electrostatic discharge
20%
Electrostatic Discharge
100%
CMOS integrated circuits
92%
Electrostatic discharge
83%
Networks (circuits)
35%
Integrated circuits
19%
Electrostatic Discharge
100%
Transistors
54%
Parasitic
39%
Electrostatic discharge
23%
Wire
20%