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個人檔案
研究專長
鑽石、氧化鋅、三族氮化物半導體磊晶薄膜成長
原子級掃描穿透式電子顯微鏡分析
界面結構與晶體缺陷
教育/學術資格
PhD, 冶金及材料科學, University of Oxford
外部位置
指紋
查看啟用 Li Chang 的研究主題。這些主題標籤來自此人的作品。共同形成了獨特的指紋。
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國家/地區層面的近期外部共同作業。按一下圓點深入探索詳細資料，或
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Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)
Wu, P. H., Chiu, K. A., Shih, F. H., Fang, Y. S., Do, T. H., Chen, W. C. & Chang, L., 1月 2023, 於: Coatings. 13, 1, 183.研究成果: Article › 同行評審
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Quasi-static modulation of multiferroic properties in flexible magnetoelectric Cr2O3/muscovite heteroepitaxy
Lai, Y. H., Shao, P. W., Kuo, C. Y., Liu, C. E., Hu, Z., Luo, C., Chen, K., Radu, F., Wang, Y. J., Zheng, J., Duan, C., Chang, C. F., Chang, L., Chen, Y. C., Cheong, S. W. & Chu, Y. H., 15 1月 2023, 於: Acta Materialia. 243, 118509.研究成果: Article › 同行評審
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Antiferroelectric PbSnO3 Epitaxial Thin Films
Lai, Y. H., Zheng, J. D., Lu, S. C., Wang, Y. K., Duan, C. G., Yu, P., Zheng, Y. Z., Huang, R., Chang, L., Chu, M. W., Hsu, J. H. & Chu, Y. H., 19 12月 2022, 於: Advanced Science. 9, 35, 2203863.研究成果: Article › 同行評審
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Epitaxial growth of TiN on (0001) semi-insulating 4H-SiC substrate by reactive sputtering
Chen, H. I., Chiu, K. A., Lin, J. F., Lin, K. Y., Chen, W. C., Wu, P. H., Ko, C. J., Chang, L. & Chen, C. H., 15 5月 2022, 於: Surface and Coatings Technology. 437, 128357.研究成果: Article › 同行評審
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First demonstration of flexible poly-Si nano-FETs (W/Lg= 50/80 nm) on the polyimide utilizing multi-wavelength laser annealing assisted by laser-buffer layer
Hou, P. C., Huang, W. H., Kao, M. H., Chen, S. W., Wang, H. H., Shen, C. H., Shieh, J. M., Pan, F. M. & Chang, L., 2022, 6th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2022. Institute of Electrical and Electronics Engineers Inc., p. 179-181 3 p. (6th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2022).研究成果: Conference contribution › 同行評審
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