岩井 洋

約聘教授

1976 …2021

每年研究成果

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  • 2017

    High-κ dielectric scaling for nano-CMOS technology

    Wong, H., Kawanago, T., Kakushima, K. & Iwai, H., 1 一月 2017, Integrated Nanodevice and Nanosystem Fabrication: Breakthroughs and Alternatives. Pan Stanford Publishing Pte. Ltd., p. 125-179 55 p.

    研究成果: Chapter同行評審

  • Trends and projections for the future of scaling and future integration trends

    Iwai, H. & Ohmi, S. I., 1 一月 2017, Digital Design and Fabrication. CRC Press, p. 1-1-1-32

    研究成果: Chapter同行評審

  • 2016

    CMOS/BiCMOS technology

    Katsumata, Y., Ohguro, T., Inoh, K., Morifuji, E., Yoshitomi, T., Kimijima, H., Nii, H., Morimoto, T., Momose, H. S., Yoshikawa, K., Ishiuchi, H. & Iwai, H., 19 四月 2016, The VLSI Handbook: Second Edition. CRC Press, p. 2.1-2.37

    研究成果: Chapter同行評審

  • 2013

    MOSFETs

    Iwai, H., Sze, S. M., Taur, Y. & Wong, H., 1 一月 2013, Guide to State-of-the-Art Electron Devices. Wiley-IEEE Press, p. 21-36 16 p.

    研究成果: Chapter同行評審

    2 引文 斯高帕斯(Scopus)
  • 2008

    High-K gate dielectrics

    Wong, H., Shiraishi, K., Kakushima, K. & Iwai, H., 1 十月 2008, Electronic Device Architectures for the Nano-CMOS Era: From Ultimate CMOS Scaling to Beyond CMOS Devices. Pan Stanford Publishing Pte. Ltd., p. 105-140 36 p.

    研究成果: Chapter同行評審

    2 引文 斯高帕斯(Scopus)
  • 2006

    Rare earth oxides in microelectronics

    Kakushima, K., Tsutsui, K., Ohmi, S. I., Ahmet, P., Rao, V. R. & Iwai, H., 28 十月 2006, Rare Earth Oxide Thin Films. Fanciulli, M. & Scarel, G. (編輯). p. 345-365 21 p. (Topics in Applied Physics; 卷 106).

    研究成果: Chapter同行評審

    20 引文 斯高帕斯(Scopus)
  • 2001

    Trends and projections for the future of scaling and future integration trends

    Iwai, H. & Ohmi, S. I., 1 一月 2001, The Computer Engineering Handbook. CRC Press, p. 1-1-1-29

    研究成果: Chapter同行評審