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查看斯高帕斯 (Scopus) 概要
柯 富祥
教授
材料科學與工程學系
https://orcid.org/0000-0001-6464-1737
h-index
h10-index
h5-index
4991
引文
40
h-指數
按照存儲在普爾（Pure）的出版物數量及斯高帕斯（Scopus）引文計算。
1226
引文
23
h-指數
按照存儲在普爾（Pure）的出版物數量及斯高帕斯（Scopus）引文計算。
340
引文
9
h-指數
按照存儲在普爾（Pure）的出版物數量及斯高帕斯（Scopus）引文計算。
1996 …
2025
每年研究成果
概覽
指紋
網路
計畫
(30)
研究成果
(297)
類似的個人檔案
(6)
指紋
查看啟用 Fu-Hsiang Ko 的研究主題。這些主題標籤來自此人的作品。共同形成了獨特的指紋。
排序方式
重量
按字母排序
Material Science
Film
100%
Lithography
88%
Silicon
80%
Surface (Surface Science)
57%
Dielectric Material
44%
Nanoparticle
40%
Thin-Film Transistor
38%
Density
37%
Sol-Gel
33%
Gold Nanoparticles
32%
Oxide Compound
30%
Nanowire
26%
Thin Films
25%
Permittivity
24%
Capacitor
21%
Thermal Stability
20%
Zinc Oxide
19%
Spin Coating
19%
Silicon Nitride
17%
Annealing
16%
Radiative Cooling
16%
Nanostructure
16%
Silver
16%
Self Assembly
15%
Copolymer
14%
Solar Cell
13%
Nitride Compound
13%
Field Effect Transistor
13%
Polyimide
12%
Silver Nanoparticle
12%
Zirconia
12%
Perovskite Solar Cell
12%
Radioactive Tracer
11%
Silicon Dioxide
11%
Transistor
11%
ZnO
11%
Hafnium
10%
Hydrogel
10%
Scanning Electron Microscopy
10%
Oxide Film
10%
Optical Property
9%
Silicate
9%
Hydrogen Peroxide
8%
Silicon Wafer
8%
Titanium Dioxide
8%
Composite Material
8%
Carbon Nanotube
8%
Diamond
8%
Silicide
8%
Charge Trapping
8%
Keyphrases
Bottom Anti-reflective Coating
39%
Gold Nanoparticles
33%
Au Nanoparticles (AuNPs)
24%
Antireflection Coating
24%
Sol-gel
22%
Electron Beam Lithography
21%
Photoresist
21%
ArF Lithography
20%
Thin-film Transistors
20%
Coating Structure
18%
Limit of Detection
17%
Gate Dielectric
17%
Coating Layer
17%
Electrical Properties
16%
Photodetector
15%
Polysilicon
15%
Deep Ultraviolet
14%
Optical Lithography
14%
Microwave Digestion
13%
Sol-gel Spin Coating
13%
Nanoparticles
13%
Silica
13%
Metal-insulator-metal Capacitor
13%
Lithography
13%
Microwave Heating
12%
Oxygen Plasma
12%
Metallic Impurities
12%
Electron Beam
12%
Bio-inspired
12%
Fabry-Perot
12%
Organic Thin-film Transistors
12%
Baking Temperature
12%
Low Dielectric Constant
11%
Optical Properties
11%
Contact Holes
10%
KrF Lithography
10%
Thermal Stability
10%
Substrate Type
10%
High Performance
10%
Nanocrystal Memory
10%
Nanogap Electrodes
10%
Silver Nanorods
9%
Zinc Oxide Thin Films
9%
Zinc Oxide
9%
Photocurrent
9%
Hafnium Silicate
9%
Silicon Substrate
9%
Silicon Nanowire Field-effect Transistor (SNWFET)
9%
Annealing
9%
Silver Nanoparticles
9%
Engineering
Nanowire
30%
Nanoparticle
19%
Field-Effect Transistor
16%
Solar Cell
15%
Electron Optical Lithography
14%
Thin-Film Transistor
14%
Gold Nanoparticles
13%
Lithography
12%
Reflectance
11%
Silicon Dioxide
11%
Dielectrics
10%
Nanopillar
9%
Fabry Perot
8%
Thin Films
8%
Coating Structure
8%
Solar Energy
8%
Biosensor
8%
Biosensing
8%
One Step
8%
Extreme-Ultraviolet Lithography
8%
Artificial Intelligence
8%
Nanomaterial
8%
Conversion Efficiency
7%
Perovskite Solar Cells
7%
Photocurrent
7%
Plasma Treatment
6%
Low-Temperature
6%
Resistive
6%
Core Shell Nanoparticles
6%
Raman Spectra
6%
Interfacial Layer
6%
Hydrogen Generation
6%
Silicon Substrate
6%
Photodetector
5%
Electrical Performance
5%
Photoresist
5%
Plasmonics
5%
Ion Implantation
5%
Metal-Insulator-Metal
5%
Rapid Thermal Annealing
5%
Photometer
5%
Detection Limit
5%
