Bing-Yue Tsui

查看斯高帕斯 (Scopus) 概要

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每年研究成果

108 Article
62 Conference contribution
11 Paper
6 Conference article
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6結果

篩選

1999
Effects of nitrogen ion implantation on the formation of nickel silicide contacts on shallow junctions
Cheng, L. W., Cheng, S. L., Chen, J. Y., Chen, L. J. & Tsui, B.-Y., 1 11月 1999, 於: Thin Solid Films. 355, p. 412-416 5 p.
研究成果 › 同行評審
36 引文斯高帕斯（Scopus）
Formation of TiSi₂ thin films on stressed (001)Si substrates
Cheng, S. L., Huang, H. Y., Peng, Y. C., Chen, L. J., Tsui, B.-Y., Tsai, C. J., Guo, S. S., Yang, Y. R. & Lin, J. T., 1 1月 1999, 於: Applied Surface Science. 142, 1, p. 295-299 5 p.
研究成果: Conference article › 同行評審
5 引文斯高帕斯（Scopus）
Novel UV baking process to improve DUV photoresist hardness
Huang, C. S., Tsui, B.-Y., Shieh, H. H. & Mohondro, R., 1999, 於: International Symposium on VLSI Technology, Systems, and Applications, Proceedings. p. 135-138 4 p.
研究成果: Conference article › 同行評審
2 引文斯高帕斯（Scopus）
The influence of stress on the growth of titanium silicide thin films on (001) silicon substrates
Cheng, S. L., Chang, S. M., Huang, H. Y., Peng, Y. C., Chen, L. J., Tsui, B.-Y., Tsai, C. J. & Guo, S. S., 1999, 於: Materials Research Society Symposium - Proceedings. 564, p. 9-14 6 p.
研究成果: Conference article › 同行評審
1996
Effects of size and shape of lateral confinement on the formation of NiSi₂, CoSi₂, and TiSi₂ on silicon inside miniature size oxide openings
Chen, L. J., Yew, J. Y., Cheng, S. L., Chen, K. M., Nakamura, K. & Tsui, B.-Y., 1 12月 1996, 於: Materials Research Society Symposium - Proceedings. 427, p. 499-504 6 p.
研究成果: Conference article › 同行評審
2 引文斯高帕斯（Scopus）
1995
An integral contact process in submicron technology
Lee, Y. H. & Tsui, B.-Y., 1995, 於: Proceedings of SPIE - The International Society for Optical Engineering. 2636, p. 222-233 12 p.
研究成果: Conference article › 同行評審

崔 秉鉞

研究成果

搜尋結果

Effects of nitrogen ion implantation on the formation of nickel silicide contacts on shallow junctions

Formation of TiSi2 thin films on stressed (001)Si substrates

Novel UV baking process to improve DUV photoresist hardness

The influence of stress on the growth of titanium silicide thin films on (001) silicon substrates

Effects of size and shape of lateral confinement on the formation of NiSi2, CoSi2, and TiSi2 on silicon inside miniature size oxide openings

An integral contact process in submicron technology

崔秉鉞

Formation of TiSi₂ thin films on stressed (001)Si substrates

Effects of size and shape of lateral confinement on the formation of NiSi₂, CoSi₂, and TiSi₂ on silicon inside miniature size oxide openings