奈米科技碩博班

Material Science

1. Silicon 100%
2. Nanowire 97%
3. Film 94%
4. Lithography 81%
5. Surface (Surface Science) 81%
6. Gold Nanoparticles 69%
7. Sol-Gel 63%
8. Density 49%
9. Nanoparticle 48%
10. Thin-Film Transistor 47%
11. Dielectric Material 42%
12. Field Effect Transistor 40%
13. Capacitor 35%
14. Thin Films 33%
15. Monolayers 31%
16. Spin Coating 29%
17. Annealing 28%
18. Hafnium 25%
19. Polyimide 24%
20. Zirconia 24%
21. Oxide Compound 23%
22. Silicate 23%
23. Copolymer 22%
24. Wet Etching 20%
25. Self Assembly 19%
26. Zirconium 18%
27. Silicon Dioxide 18%
28. Electrical Property 17%
29. Nanostructure 17%
30. Polystyrene 15%
31. Silicide 14%
32. Silsesquioxane 14%
33. Ultrathin Film 14%
34. Gold Nanoparticle 13%
35. Charge Trapping 12%
36. Semiconductor Device 12%
37. Titanium Dioxide 12%
38. Nanodots 12%
39. Hydrogen Bonding 12%
40. Nitride Compound 12%
41. Thermal Stability 12%
42. X-Ray Photoelectron Spectroscopy 12%
43. Atomic Force Microscopy 11%
44. Platinum 10%
45. Silver Nanoparticle 10%
46. Transistor 9%
47. Tantalum Oxides 9%
48. Quantum Dot 9%
49. Fullerene 9%
50. Electroless Deposition 9%
51. Composite Material 9%
52. Phase Composition 9%
53. Capacitance 9%
54. Aluminum Oxide 9%
55. Transmission Electron Microscopy 8%
56. DNA 8%
57. Analytical Method 8%
58. Nanorod 7%
59. Polyhedral Oligomeric Silsesquioxane 7%
60. Poly Methyl Methacrylate 7%
61. Catalyst Activity 7%
62. Oxide Surface 7%
63. Heterojunction 7%
64. Surface Morphology 6%
65. Oxide Film 6%
66. Desorption 6%
67. Linewidth 6%
68. Surface Tension 6%
69. Scanning Electron Microscopy 6%
70. Light-Emitting Diode 6%
71. Dielectric Films 6%
72. Silicon Wafer 6%
73. Optical Property 6%
74. Titanium Oxide 6%
75. Contact Angle 5%
76. Silicon Nitride 5%
77. Sensitive Detection 5%
78. Oxidation Reaction 5%
79. Permittivity 5%

Keyphrases

1. Gold Nanoparticles 56%
2. Sol-gel 47%
3. Silicon Nanowires (SiNWs) 37%
4. Thin-film Transistors 34%
5. Nanowires 33%
6. Scanning Probe Lithography 32%
7. Sol-gel Spin Coating 29%
8. Metal-insulator-metal Capacitor 29%
9. Polysilicon 27%
10. Au Nanoparticles (AuNPs) 27%
11. Electrical Properties 25%
12. Nanocrystal Memory 24%
13. Silicon Nanowire Field-effect Transistor (SNWFET) 24%
14. Gate-all-around 24%
15. Hafnium Silicate 22%
16. Silica 22%
17. Nanoparticles 20%
18. Gate Dielectric 20%
19. Wet Etching 20%
20. Nanostructures 19%
21. Annealing 19%
22. Poly-Si 19%
23. Nanogap Electrodes 19%
24. NWFET 19%
25. Rapid Thermal Annealing 18%
26. Electrical Characteristics 17%
27. Memory Device 17%
28. Flash Memory 17%
29. Field-effect Transistors 16%
30. Electrical Performance 16%
31. Nanocrystals 15%
32. SiO2 Surface 15%
33. Self-aligned 15%
34. Selective Deposition 15%
35. Low Leakage Current 15%
36. Zirconium Silicate 15%
37. Leakage Current Density 15%
38. Optical Lithography 15%
39. Plasma Treatment 15%
40. Charge Retention 14%
41. Microwave Heating 14%
42. Nanogap 14%
43. Self-assembled Monolayer 14%
44. Organic Thin-film Transistors 14%
45. Poly(3-hexylthiophene) (P3HT) 14%
46. Silicon Oxide 14%
47. Electron Beam Lithography 13%
48. Ultrathin Films 13%
49. Wafer 13%
50. Poly(4-vinylpyridine) 13%
51. High Performance 13%
52. Atomic Force Microscopy 13%
53. Polysilicon Nanowires 12%
54. Electron Beam 12%
55. Conductance 12%
56. N-(2-aminoethyl)-3-aminopropyltrimethoxysilane 12%
57. Local Joule Heating 12%
58. Polyimide Substrate 12%
59. Flexible Polyimide Substrates 11%
60. Nanofabrication Techniques 11%
61. Charge Trapping Layer 11%
62. Label-free Detection 11%
63. X-ray Photoelectron Spectroscopy 11%
64. Ultrasensitive 11%
65. Nanodot Array 11%
66. Target DNA 11%
67. Silicon-oxide-nitride-oxide-silicon (SONOS) 10%
68. Lithography 10%
69. Silicon Dioxide 10%
70. O2 Plasma 10%
71. P123 10%
72. Memory Window 10%
73. Oxide Surfaces 10%
74. Deoxyribonucleic Acid 10%
75. Fabrication Methods 10%
76. Core-shell 9%
77. Nanoparticle Synthesis 9%
78. Yb2O3 9%
79. Tantalum Oxide 9%
80. Multi-channel 9%
81. Nitrided Oxide 9%
82. Selective Growth 9%
83. Functionalized Gold Nanoparticles 9%
84. Label-free Biosensor 9%
85. Silsesquioxane 9%
86. Gene mutation 9%
87. Polyhedral Oligomeric Silsesquioxane 9%
88. Electroless Deposition 9%
89. Gray Level 9%
90. Resistive Switching 9%
91. Composite Materials 9%
92. Low Temperature 9%
93. Oxide Nitride 9%
94. Multi-walled Carbon Nanotubes (MWCNTs) 9%
95. Impedance Biosensor 9%
96. Prostate-specific Antigen 9%
97. Ultra-thin Body 9%
98. Surface Cleaning 9%
99. Dip-pen Nanolithography 9%
100. Increased Reliability 9%