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21404 引文
58 h-指數
928 Article
704 Conference contribution
73 Patent
62 Conference article
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9結果

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2021
Gateway towards recent developments in quantum dot-based light-emitting diodes
Huang, Y. M., James Singh, K., Hsieh, T. H., Langpoklakpam, C., Lee, T. Y., Lin, C.-C., Li, Y., Chen, F. C., Chen, S. C., Kuo, H. C. & He, J. H., 15 12月 2021, 於: Nanoscale. 14, 11, p. 4042-4064 23 p.
研究成果: Review article › 同行評審
12 引文斯高帕斯（Scopus）
2017
The 2017 Plasma Roadmap: Low temperature plasma science and technology
Adamovich, I., Baalrud, S. D., Bogaerts, A., Bruggeman, P. J., Cappelli, M., Colombo, V., Czarnetzki, U., Ebert, U., Eden, J. G., Favia, P., Graves, D. B., Hamaguchi, S., Hieftje, G., Hori, M., Kaganovich, I. D., Kortshagen, U., Kushner, M. J., Mason, N. J., Mazouffre, S. & Thagard, S. M. 及其他18, Metelmann, H. R., Mizuno, A., Moreau, E., Murphy, A. B., Niemira, B. A., Oehrlein, G. S., Petrovic, Z. L., Pitchford, L. C., Pu, Y. K., Rauf, S., Sakai, O., Samukawa, S., Starikovskaia, S., Tennyson, J., Terashima, K., Turner, M. M., Van De Sanden, M. C. M. & Vardelle, A., 14 7月 2017, 於: Journal of Physics D: Applied Physics. 50, 32, 323001.
研究成果: Review article › 同行評審

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767 引文斯高帕斯（Scopus）
2012
The 2012 plasma roadmap
Samukawa, S., Hori, M., Rauf, S., Tachibana, K., Bruggeman, P., Kroesen, G., Whitehead, J. C., Murphy, A. B., Gutsol, A. F., Starikovskaia, S., Kortshagen, U., Boeuf, J. P., Sommerer, T. J., Kushner, M. J., Czarnetzki, U. & Mason, N., 27 6月 2012, 於: Journal of Physics D: Applied Physics. 45, 25, 253001.
研究成果: Review article › 同行評審
545 引文斯高帕斯（Scopus）
2007

Advanced nano-devices produced by high-performance plasma etching processes
Samukawa, S., 2007, 於: Journal of the Japan Society for Precision Engineering. 73, 9, p. 993-998 6 p.
研究成果: Review article › 同行評審

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2006
High-performance and damage-free magnetic film etching using pulse-time-modulated Cl₂ plasma
Mukai, T., Hada, H., Tahara, S., Yoda, H. & Samukawa, S., 20 6月 2006, 於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 45, 6 B, p. 5542-5544 3 p.
研究成果: Review article › 同行評審
19 引文斯高帕斯（Scopus）
New fabrication technology of fin field effect transistors using neutral-beam etching
Endo, K., Noda, S., Ozaki, T., Samukawa, S., Masahara, M., Liu, Y., Ishii, K., Takashima, H., Sugimata, E., Matsukawa, T., Yamauchi, H., Ishikawa, Y. & Suzuki, E., 20 6月 2006, 於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 45, 6 B, p. 5513-5516 4 p.
研究成果: Review article › 同行評審
4 引文斯高帕斯（Scopus）
Ultimate top-down etching processes for future nanoscale devices: Advanced neutral-beam etching
Samukawa, S., 7 4月 2006, 於: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 45, 4 A, p. 2395-2407 13 p.
研究成果: Review article › 同行評審

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139 引文斯高帕斯（Scopus）
1998
Ultrahigh frequency versus inductively coupled chlorine plasmas: Comparisons of Cl and Cl₂ concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy
Malyshev, M. V., Donnelly, V. M. & Samukawa, S., 1 8月 1998, 於: Journal of Applied Physics. 84, 3, p. 1222-1230 9 p.
研究成果: Review article › 同行評審
80 引文斯高帕斯（Scopus）
1993
A theoretical analysis of millimeter-wave GaAs/AlGaAs multiquantum well transit time devices by the lucky drift model
Meng, C.-C. & Fetterman, H. R., 1 1月 1993, 於: Solid State Electronics. 36, 3, p. 435-442 8 p.
研究成果: Review article › 同行評審
9 引文斯高帕斯（Scopus）

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