Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
- X. P. Wang
- , M. F. Li
- , H. Y. Yu
- , J. J. Yang
- , J. D. Chen
- , C. X. Zhu
- , A. Y. Du
- , W. Y. Loh
- , S. Biesemans
- , Albert Chin
- , G. Q. Lo
- , D. L. Kwong
Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review