Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric

  • X. P. Wang
  • , M. F. Li
  • , H. Y. Yu
  • , J. J. Yang
  • , J. D. Chen
  • , C. X. Zhu
  • , A. Y. Du
  • , W. Y. Loh
  • , S. Biesemans
  • , Albert Chin
  • , G. Q. Lo
  • , D. L. Kwong

    Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

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    Material Science