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Voltage scaling and temperature effects on drain leakage current degradation in a hot carrier stressed n-MOSFET
Ta-Hui Wang*, C. F. Hsu, L. P. Chiang, N. K. Zous, Tien-Sheng Chao, C. Y. Chang
*Corresponding author for this work
Research output: Contribution to journal › Conference article › peer-review
1
Scopus
citations