VERY THIN NITRIDE/OXIDE COMPOSITE GATE INSULATOR FOR VLSI CMOS.

L. Dori*, J. Sun, M. Arienzo, S. Basavaiah, Y. Taur, D. Zichermann

*Corresponding author for this work

    Research output: Contribution to journalConference articlepeer-review

    12 Scopus citations

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    Engineering & Materials Science