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Using BCl 3 -based plasma to modify wet-etching pattern sapphire substrate for improving the growth of GaN-Based LEDs
Bo Wen Lin*, Chen Yi Niu, Cheng Yu Hsieh, Bau Ming Wang, Wen Ching Hsu, Ray Ming Lin, Yew-Chuhg Wu
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
2
Scopus
citations