Ultrathin zirconium silicate films deposited on Si(100) using Zr(Oi-Pr)2(thd)2, Si(Ot-Bu)2(thd)2, and nitric oxide

H. W. Chen*, T. Y. Huang, D. Landheer, X. Wu, S. Moisa, G. I. Sproule, J. K. Kim, W. N. Lennard, Tien-Sheng Chao

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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Engineering & Materials Science

Chemical Compounds