Ultrathin Si capping layer suppresses charge trapping in HfO xNy/Ge metal-insulator-semiconductor capacitors

Chao Ching Cheng*, Chao-Hsin Chien, Guang Li Luo, Chun Hui Yang, Mei Ling Kuo, Je Hung Lin, Chun Yen Chang

*Corresponding author for this work

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