TY - GEN
T1 - Ultra-low-leakage power-rail ESD clamp circuit in a 65-nm CMOS technology
AU - Altolaguirre, Federico A.
AU - Ker, Ming-Dou
PY - 2013/8/15
Y1 - 2013/8/15
N2 - The gate tunneling current impacts seriously on the power-rail ESD clamp circuit, causing a large leakage current through the MOS capacitor used in ESD detection. In this work, a novel technique is implemented to eliminate the gate leakage current through the MOS capacitor by using a couple of transistors to control the voltage drop across the RC delay in the ESD detection circuit. This circuit has been verified in a 65-nm CMOS technology, with a total leakage current of 165nA under 1V bias, at 25°C, and a ESD robustness of 3kV HBM and 200V MM.
AB - The gate tunneling current impacts seriously on the power-rail ESD clamp circuit, causing a large leakage current through the MOS capacitor used in ESD detection. In this work, a novel technique is implemented to eliminate the gate leakage current through the MOS capacitor by using a couple of transistors to control the voltage drop across the RC delay in the ESD detection circuit. This circuit has been verified in a 65-nm CMOS technology, with a total leakage current of 165nA under 1V bias, at 25°C, and a ESD robustness of 3kV HBM and 200V MM.
UR - http://www.scopus.com/inward/record.url?scp=84881348290&partnerID=8YFLogxK
U2 - 10.1109/VLDI-DAT.2013.6533866
DO - 10.1109/VLDI-DAT.2013.6533866
M3 - Conference contribution
AN - SCOPUS:84881348290
SN - 9781467344357
T3 - 2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013
BT - 2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013
T2 - 2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013
Y2 - 22 April 2013 through 24 April 2013
ER -