Ultra-low-leakage power-rail ESD clamp circuit in a 65-nm CMOS technology

Federico A. Altolaguirre, Ming-Dou Ker

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    7 Scopus citations

    Abstract

    The gate tunneling current impacts seriously on the power-rail ESD clamp circuit, causing a large leakage current through the MOS capacitor used in ESD detection. In this work, a novel technique is implemented to eliminate the gate leakage current through the MOS capacitor by using a couple of transistors to control the voltage drop across the RC delay in the ESD detection circuit. This circuit has been verified in a 65-nm CMOS technology, with a total leakage current of 165nA under 1V bias, at 25°C, and a ESD robustness of 3kV HBM and 200V MM.

    Original languageEnglish
    Title of host publication2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013
    DOIs
    StatePublished - 15 Aug 2013
    Event2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013 - Hsinchu, Taiwan
    Duration: 22 Apr 201324 Apr 2013

    Publication series

    Name2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013

    Conference

    Conference2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013
    Country/TerritoryTaiwan
    CityHsinchu
    Period22/04/1324/04/13

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