Ultimate top-down etching processes for future nanoscale devices: Advanced neutral-beam etching

Keyphrases

• Beam Source 33%
• Bottom-up Processing 33%
• Charge Buildup 33%
• Damage-free Etching 33%
• Etching Performance 33%
• Etching Process 100%
• Etching Technology 33%
• Fabrication Technology 33%
• Inorganic Materials 33%
• Integrated Device 33%
• Nanodevices 33%
• Nanoscale Devices 100%
• Neutral Beam 66%
• Neutral Beam Etching 100%
• Organic Matter 33%
• Pattern Size 33%
• Photon Radiation 33%
• Plasma Etching 33%
• Plasma Process 33%
• Radiation Limits 33%
• Sub-10 Nm 33%
• Surface Modification 33%
• Ultra-large-scale 33%
• UV Photons 33%

Physics

• Integrated Circuit 25%
• Nanoscale 100%
• Neutral Beams 100%
• Organic Material 25%
• Plasma Etching 25%
• Plasma Process 25%

Material Science

• Nanodevice 100%
• Plasma Etching 100%
• Surface Modification 100%