Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

D. Gupta; King-Ning Tu; K. W. Asai

doi:10.1016/0040-6090(82)90632-0

Tracer diffusion in amorphous Pd₈₀Si₂₀ and Gd₁₆Co₈₄ films

D. Gupta^*, King-Ning Tu, K. W. Asai

^*Corresponding author for this work

International College of Semiconductor Technology

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Evaporated Pd₈₀Si₂₀ and sputtered Gd₁₆Co₈₄ amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au¹⁹⁵ and Co⁵⁷ tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.

Original language	English
Pages (from-to)	131-137
Number of pages	7
Journal	Thin Solid Films
Volume	90
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(82)90632-0
State	Published - 16 Apr 1982

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title = "Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films",

abstract = "Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.",

author = "D. Gupta and King-Ning Tu and Asai, {K. W.}",

year = "1982",

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T1 - Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

AU - Gupta, D.

AU - Tu, King-Ning

AU - Asai, K. W.

PY - 1982/4/16

Y1 - 1982/4/16

N2 - Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.

AB - Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented.

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U2 - 10.1016/0040-6090(82)90632-0

DO - 10.1016/0040-6090(82)90632-0

M3 - Article

AN - SCOPUS:0019553760

SN - 0040-6090

VL - 90

SP - 131

EP - 137

JO - Thin Solid Films

JF - Thin Solid Films

IS - 2

ER -

Tracer diffusion in amorphous Pd₈₀Si₂₀ and Gd₁₆Co₈₄ films

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