Thermal stability of Co-sputtered Ru-Ti alloy electrodes for dynamic random access memory applications

Ray-Hua Horng*, Dong Sing Wuu, Luh Huei Wu, Ming Kwei Lee, Shih Hsiung Chan, Ching Chich Leu, Tiao Yuan Huang, Simon Min Sze

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Material Science

Engineering