Thermal reactions of F₂ and NF₃ with silicon(110) studied by laser ionization mass spectrometry

Engineering & Materials Science

• Activation energy 31%
• Electrons 30%
• Etching 64%
• Hot Temperature 28%
• Ionization 77%
• Lasers 45%
• Mass spectrometry 76%
• Photons 17%
• Silicon 46%
• Substrates 10%
• Temperature 17%

Physics & Astronomy

• activation energy 21%
• difluorides 22%
• etching 45%
• fluorides 29%
• ionization 41%
• lasers 26%
• mass spectroscopy 58%
• photons 8%
• products 19%
• silicon 32%
• temperature 4%

Chemical Compounds

• Electron Ionization 19%
• Electron Ionization Mass Spectroscopy 20%
• Etching 53%
• Fluoride 24%
• Ionization 23%
• Laser Ionization Mass Spectroscopy 100%
• Reaction Activation Energy 20%
• Resonance 11%