The role of a resist during O2 plasma ashing and its impact on the reliability evaluation of ultrathin gate oxides

Chao-Hsin Chien*, Chun Yen Chang, Horng-Chih Lin, Tsai Fu Chang, Szu Kang Hsien, Hua Chou Tseng, Shean Guang Chiou, Tiao Yuan Huang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Physics & Astronomy