| Original language | English |
|---|---|
| Patent number | US7,501,348B2 |
| State | Published - 10 Mar 2009 |
The method for forming a semiconductor structure having nanometer line-width
Edward Yi Chang (Inventor)
Research output: Patent
Edward Yi Chang (Inventor)
Research output: Patent
| Original language | English |
|---|---|
| Patent number | US7,501,348B2 |
| State | Published - 10 Mar 2009 |