The impact of N-drift implant on ESD robustness of high-voltage NMOS with embedded SCR structure in 40-V CMOS process

Wei Jen Chang*, Ming-Dou Ker, Tai Xiang Lai, Tien Hao Tang, Kuan Cheng Su

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Scopus citations

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    Engineering & Materials Science