@inproceedings{a816f56fd5794d0f975f16e38dc5a562,
title = "The ellipsometric measurements on SiO2 by intensity ratio technique",
abstract = "A PSA photometric ellipsometric technique is used to measure the ellipsometric parameters, ψ and Δ. Taking intensity ratios of A = I(π/4+dp,dA)/I(π4+dp/,π2+dA) and B = I(-π/4+dp,dA)/I(-π/4+dp,π/2+dA) to their first order approximation under small azimuth deviations of polarizer (dp) and analyzer (dA), we find that at fixed dA these two ratios have opposite gradient with respect to dp and intersect to each other at a special dp where A= B EQ tan2ψ, and the position of this dp is linearly related to cos Δ. For comparison, ψ and Δ of a SiO2/Si thin film are measured by conventional null ellipsometry and intensity ratio technique. An higher percentage error on Δ is expected for this PSA system. The source of errors will be discussed.",
author = "Chao, {Yu Faye} and Wei, {C. S.} and Lee, {W. C.} and Lin, {S. C.} and Tien-Sheng Chao",
year = "1994",
month = dec,
day = "1",
doi = "10.1117/12.186666",
language = "English",
isbn = "0819415898",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Society of Photo-Optical Instrumentation Engineers",
pages = "171--180",
editor = "Goldstein, {Dennis H.} and Chenault, {David B.}",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "null ; Conference date: 25-07-1994 Through 27-07-1994",
}