The effect of x-ray irradiation on the novella type photoresist

Hsin Chiang You; Shao Hui Shieh; Shiang Jun Zhang; Fu-Hsiang Ko; Hsiung Min Lin; Shyh Chang Tsaur; Chin Che Lin

doi:10.1109/INEC.2010.5425037

The effect of x-ray irradiation on the novella type photoresist

Hsin Chiang You^*, Shao Hui Shieh, Shiang Jun Zhang, Fu-Hsiang Ko, Hsiung Min Lin, Shyh Chang Tsaur, Chin Che Lin

^*Corresponding author for this work

Institute of Nonotechnology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
Number of pages	1
DOIs	https://doi.org/10.1109/INEC.2010.5425037
State	Published - 5 May 2010
Event	2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, China Duration: 3 Jan 2010 → 8 Jan 2010

Publication series

Name	INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Conference

Conference	2010 3rd International Nanoelectronics Conference, INEC 2010
Country/Territory	China
City	Hongkong
Period	3/01/10 → 8/01/10

Access to Document

10.1109/INEC.2010.5425037

Cite this

You, H. C., Shieh, S. H., Zhang, S. J., Ko, F.-H., Lin, H. M., Tsaur, S. C., & Lin, C. C. (2010). The effect of x-ray irradiation on the novella type photoresist. In INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings Article 5425037 (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings). https://doi.org/10.1109/INEC.2010.5425037

@inproceedings{a75c56889e3d4f0b9467a32d5f39f08f,

title = "The effect of x-ray irradiation on the novella type photoresist",

author = "You, {Hsin Chiang} and Shieh, {Shao Hui} and Zhang, {Shiang Jun} and Fu-Hsiang Ko and Lin, {Hsiung Min} and Tsaur, {Shyh Chang} and Lin, {Chin Che}",

year = "2010",

month = may,

day = "5",

doi = "10.1109/INEC.2010.5425037",

language = "English",

isbn = "9781424435449",

series = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

booktitle = "INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings",

note = "2010 3rd International Nanoelectronics Conference, INEC 2010 ; Conference date: 03-01-2010 Through 08-01-2010",

}

You, HC, Shieh, SH, Zhang, SJ, Ko, F-H, Lin, HM, Tsaur, SC & Lin, CC 2010, The effect of x-ray irradiation on the novella type photoresist. in INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings., 5425037, INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings, 2010 3rd International Nanoelectronics Conference, INEC 2010, Hongkong, China, 3/01/10. https://doi.org/10.1109/INEC.2010.5425037

The effect of x-ray irradiation on the novella type photoresist. / You, Hsin Chiang; Shieh, Shao Hui; Zhang, Shiang Jun et al.
INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings. 2010. 5425037 (INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - The effect of x-ray irradiation on the novella type photoresist

AU - You, Hsin Chiang

AU - Shieh, Shao Hui

AU - Zhang, Shiang Jun

AU - Ko, Fu-Hsiang

AU - Lin, Hsiung Min

AU - Tsaur, Shyh Chang

AU - Lin, Chin Che

PY - 2010/5/5

Y1 - 2010/5/5

UR - http://www.scopus.com/inward/record.url?scp=77951655856&partnerID=8YFLogxK

U2 - 10.1109/INEC.2010.5425037

DO - 10.1109/INEC.2010.5425037

M3 - Conference contribution

AN - SCOPUS:77951655856

SN - 9781424435449

T3 - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

BT - INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

T2 - 2010 3rd International Nanoelectronics Conference, INEC 2010

Y2 - 3 January 2010 through 8 January 2010

ER -

The effect of x-ray irradiation on the novella type photoresist

Publication series

Conference

Access to Document

Other files and links

Cite this