The Correlation of Plasma Characteristics to the Deposition Rate of Plasma Polymerized Methyl Methacrylate Thin Films in an Inductively Coupled Plasma System

Stephen T. Hsieh, Himanshu Mishra, Nima Bolouki, Weite Wu, Chuan Li, Jang Hsing Hsieh*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

A plasma system attached with one internal coil (for generating inductively coupled plasma) and two sputtering carbon targets was set up to deposit PP-MMA (plasma polymerized methyl methacrylate) thin films. PP-MMA was used as a model material in the present study. In the experiment, the working pressure and Ar/MMA flow ratio were varied, which resulted in the change in plasma conditions as well as the deposition rates. The optical emission spectroscopy (OES) method was applied to identify the presence of the excited species related to the fragmented monomer. In addition, the electron temperature and electron density were determined using the modified Boltzmann plot and line-ratio method, according to the measured OES spectra. The deposition rate of the PMMA film was then correlated with the determined plasma characteristics. To determine the vibrational modes of the deposited PP-MMA films, Fourier transformed infrared spectrometry (FTIR) was used. The highest deposition rate of PP-MMA could be obtained with the optimized working pressure and Ar/MMA volume ratio. This could be related to the plasma characteristics that contribute to the fragmentation of the monomer in the plasma.

Original languageEnglish
Article number1014
JournalCoatings
Volume12
Issue number7
DOIs
StatePublished - Jul 2022

Keywords

  • inductively coupled plasma
  • optical emission spectrometer
  • plasma polymerization
  • PMMA

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