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Temperature dependence of CH radical reactions with O
2
, NO, CO and CO
2
M. R. Berman
*
, J. W. Fleming
, A. B. Harvey
,
Ming-Chang Lin
*
Corresponding author for this work
Department of Applied Chemistry
Research output
:
Contribution to journal
›
Article
›
peer-review
81
Scopus citations
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2
, NO, CO and CO
2
'. Together they form a unique fingerprint.
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Keyphrases
Temperature Effect
100%
Radical Reactions
100%
CH Radical
100%
Temperature Range
66%
Buffer Gas
66%
Temperature Rise
33%
Room Temperature
33%
Pressure Dependence
33%
Increased Temperature
33%
Laser Photolysis
33%
Reaction Rate
33%
Long-lived
33%
CHBr3
33%
Multiphoton Dissociation
33%
Probing Techniques
33%
Negative Temperature Coefficient
33%
Buffer Gas Pressure
33%
CO2 Increase
33%
Engineering
Torr
100%
Temperature Dependence
100%
Buffer Gas
100%
Radical Reaction
100%
Temperature Range
66%
Rate Constant
66%
Temperature Increase
33%
Room Temperature
33%
Increasing Temperature
33%
Temperature Coefficient
33%
Gas Pressure
33%
Chemistry
Buffer Solution
100%
Radical Reaction
100%
Carbon Dioxide
100%
Rate Constant
66%
Ambient Reaction Temperature
33%
Photolysis
33%
Physics
Temperature Dependence
100%
Carbon Dioxide
100%
Room Temperature
33%
Photolysis
33%
Gas Pressure
33%
Chemical Engineering
Carbon Dioxide
100%
Negative Temperature Coefficient
33%
Material Science
Carbon Dioxide
100%
Photolysis
33%