Temperature dependence of CH radical reactions with H2O and CH2O

S. Zabarnick; J. W. Fleming; Ming-Chang Lin

doi:10.1016/S0082-0784(88)80303-5

Temperature dependence of CH radical reactions with H₂O and CH₂O

S. Zabarnick^*, J. W. Fleming, Ming-Chang Lin

^*Corresponding author for this work

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

The temperature dependence of the reactions CH+H₂O and CH+CH₂O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr₃ at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H₂O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10^-12exp[(380±20)/T] cm³s^-1 for the temperature range 298 to 669 K. The reaction CH+CH₂O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10^-10 exp[(260±30)T] cm³s^-1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H₂O and CH₂O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.

Original language	English
Pages (from-to)	713-719
Number of pages	7
Journal	Symposium (International) on Combustion
Volume	21
Issue number	1
DOIs	https://doi.org/10.1016/S0082-0784(88)80303-5
State	Published - 1 Jan 1988

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title = "Temperature dependence of CH radical reactions with H2O and CH2O",

abstract = "The temperature dependence of the reactions CH+H2O and CH+CH2O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr3 at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H2O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10-12exp[(380±20)/T] cm3s-1 for the temperature range 298 to 669 K. The reaction CH+CH2O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10-10 exp[(260±30)T] cm3s-1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H2O and CH2O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.",

author = "S. Zabarnick and Fleming, {J. W.} and Ming-Chang Lin",

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T1 - Temperature dependence of CH radical reactions with H2O and CH2O

AU - Zabarnick, S.

AU - Fleming, J. W.

AU - Lin, Ming-Chang

PY - 1988/1/1

Y1 - 1988/1/1

N2 - The temperature dependence of the reactions CH+H2O and CH+CH2O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr3 at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H2O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10-12exp[(380±20)/T] cm3s-1 for the temperature range 298 to 669 K. The reaction CH+CH2O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10-10 exp[(260±30)T] cm3s-1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H2O and CH2O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.

AB - The temperature dependence of the reactions CH+H2O and CH+CH2O were studied from 297 to 670 K in 100 torr of argon using the two-laser photolysis/LIF probe technique. The CH radicals were produced by the multiphoton dissociation of CHBr3 at 266 nm and monitored by LIF at 429.8 nm. The reaction CH+H2O is independent of total pressures between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(9.49±0.05)×10-12exp[(380±20)/T] cm3s-1 for the temperature range 298 to 669 K. The reaction CH+CH2O is also independent of total pressure between 20 and 300 torr at room temperature and can be fit to the Arrhenius expression, k=(1.57±0.14)×10-10 exp[(260±30)T] cm3s-1 for the temperature range 297 to 670 K. The negative activation energies, energetics, and known CH behavior point to CH insertion into both H2O and CH2O as the primary reaction paths. The insertion products undergo rapid decomposition and collisional stabilization is unable to compete under these conditions.

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Temperature dependence of CH radical reactions with H₂O and CH₂O

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