Surface roughness control by energy shift in deep X-ray lithography

Y. Cheng; C. N. Chen; C. C. Chieng; F. G. Tseng; Jeng-Tzong Sheu

doi:10.1007/s00542-002-0202-x

Surface roughness control by energy shift in deep X-ray lithography

Y. Cheng^*, C. N. Chen, C. C. Chieng, F. G. Tseng, Jeng-Tzong Sheu

^*Corresponding author for this work

Institute of Biomedical Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Previous studies show that the surface roughness of the sidewall generated by deep X-ray lithography (DXL) is a function of the photon energy of X-rays. Present study demonstrates and reveals the ideas of controlling surface roughness by tuning irradiation photon energy on the sidewall using the developing temperature. The ideas are resulted from two observations (1) X-rays of higher energy induce photoelectrons of higher energy in the resist and the corresponding scattering distance is nearly a square function of electron energy [1], and (2) high-energy X-rays are expected to induce more surface roughness and this effect has been observed by different laboratory [2].

Original language	English
Pages (from-to)	163-166
Number of pages	4
Journal	Microsystem Technologies
Volume	9
Issue number	3
DOIs	https://doi.org/10.1007/s00542-002-0202-x
State	Published - Jan 2003

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title = "Surface roughness control by energy shift in deep X-ray lithography",

abstract = "Previous studies show that the surface roughness of the sidewall generated by deep X-ray lithography (DXL) is a function of the photon energy of X-rays. Present study demonstrates and reveals the ideas of controlling surface roughness by tuning irradiation photon energy on the sidewall using the developing temperature. The ideas are resulted from two observations (1) X-rays of higher energy induce photoelectrons of higher energy in the resist and the corresponding scattering distance is nearly a square function of electron energy [1], and (2) high-energy X-rays are expected to induce more surface roughness and this effect has been observed by different laboratory [2].",

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AU - Cheng, Y.

AU - Chen, C. N.

AU - Chieng, C. C.

AU - Tseng, F. G.

AU - Sheu, Jeng-Tzong

PY - 2003/1

Y1 - 2003/1

N2 - Previous studies show that the surface roughness of the sidewall generated by deep X-ray lithography (DXL) is a function of the photon energy of X-rays. Present study demonstrates and reveals the ideas of controlling surface roughness by tuning irradiation photon energy on the sidewall using the developing temperature. The ideas are resulted from two observations (1) X-rays of higher energy induce photoelectrons of higher energy in the resist and the corresponding scattering distance is nearly a square function of electron energy [1], and (2) high-energy X-rays are expected to induce more surface roughness and this effect has been observed by different laboratory [2].

AB - Previous studies show that the surface roughness of the sidewall generated by deep X-ray lithography (DXL) is a function of the photon energy of X-rays. Present study demonstrates and reveals the ideas of controlling surface roughness by tuning irradiation photon energy on the sidewall using the developing temperature. The ideas are resulted from two observations (1) X-rays of higher energy induce photoelectrons of higher energy in the resist and the corresponding scattering distance is nearly a square function of electron energy [1], and (2) high-energy X-rays are expected to induce more surface roughness and this effect has been observed by different laboratory [2].

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SN - 0946-7076

VL - 9

SP - 163

EP - 166

JO - Microsystem Technologies

JF - Microsystem Technologies

IS - 3

ER -

Surface roughness control by energy shift in deep X-ray lithography

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