Suppression of Total Dose Effects on the Performance of InAlGaN/GaN MIS-HEMT via Field Plate Implementation

Yi En Chang-Chien, Chin Han Chung*, Chih Yi Yang, Cheng Jun Ma, Xiang You Ye, You Chen Weng, Edward Yi Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, quaternary InAlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) aimed for power applications were exposed to 800 krad of Co{60}~\gamma -ray, and their response to total dose effects was recorded. For the irradiation process, devices with five gate-connected field plate schemes of field plate length (without field plate, 2~\mu m, 4, \mu m, 6~\mu m, 8~\mu m) were tested under either a grounded state or a stressed state. It was discovered that the implementation of the field plate could successfully suppress the virtual gate phenomenon exacerbated by total dose effects. Post-irradiation analysis of the reverse characteristics also revealed that for devices irradiated under a stressed state, field plates could increase the device robustness against total dose effects impacting the electrical breakdown.

Original languageEnglish
Pages (from-to)407-413
Number of pages7
JournalIEEE Transactions on Device and Materials Reliability
Volume24
Issue number3
DOIs
StatePublished - 2024

Keywords

  • Quaternary compound
  • field plate structure
  • indium aluminum gallium nitride (InAlGaN)
  • metal-insulator-semiconductor high electron mobility transistor (MIS-HEMT)
  • total dose effects

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